Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4"
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|[https://www.nanotech.ucsb.edu/wiki/images/f/f9/SiO2_Etch_using_ICP2-no_O2-a.pdf] |
|[https://www.nanotech.ucsb.edu/wiki/images/f/f9/SiO2_Etch_using_ICP2-no_O2-a.pdf] |
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+ | |3/6/19 |
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+ | |I21904 |
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+ | |151 |
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+ | |1.23 |
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+ | |85.6 |
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