Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"
Jump to navigation
Jump to search
(→About) |
|||
Line 2: | Line 2: | ||
|picture=KLA.jpg |
|picture=KLA.jpg |
||
|type = Inspection, Test and Characterization |
|type = Inspection, Test and Characterization |
||
− | |super= |
+ | |super= Tom Reynolds |
|location=Bay 5 |
|location=Bay 5 |
||
|description = ? |
|description = ? |
Revision as of 14:21, 10 July 2015
|
About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.