Difference between revisions of "Stepper 3 (ASML DUV)"
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|location=Bay 3 |
|location=Bay 3 |
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|email=abrahamsen@ece.ucsb.edu |
|email=abrahamsen@ece.ucsb.edu |
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| − | |description = ASML PAS |
+ | |description = ASML PAS 5500/300 DUV Stepper |
|manufacturer = ASML |
|manufacturer = ASML |
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|materials = |
|materials = |
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Revision as of 13:46, 11 March 2014
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About
The ASML DUV stepper is a 248nm line stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm. The system is a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57NA. Overlay accuracy is better than 30nm. The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.