Difference between revisions of "Dry Etching Recipes"

Revision as of 15:49, 9 July 2015

R = Recipe is available. Clicking this link will take you to the recipe.

Dry Etching Recipes
	RIE Etching				ICP Etching				Oxygen Plasma Systems				Other Dry Etchers
Material	RIE 1 (Custom)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PTI/Bosch)	ICP Etch 1 (Panasonic 1)	ICP Etch 2 (Panasonic 2)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Al						R	R
Ti						R	A
Cr				A		R	A
Ge
Ag
Ru
Mo
Ta
W-TiW						R	A
Al₂O₃
HfO₂
ITO		R
SiO₂						R	R							R
SiN						R	R
SiOxNy
Ta₂O₅
TiO₂
TiN
ZnO₂
ZrO₂
GaAs				R		R	R	R
AlGaAs				R		R		R
InGaAlAs		R						R
InGaAsP		R
InP		R						R
GaN				R		R		R
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdZnTe		R
ZnSe
Si					R								R
SiC						R	A
Sapphire						R	A
Material	RIE 1 (Custom)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PlasmaTherm/Bosch Etch)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)

@@ Line 8: / Line 8: @@
 ! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[ICP Etching Recipes|ICP Etching]]'''
 ! bgcolor="#D0E7FF" align="center" colspan="4"|'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
-! bgcolor="#D0E7FF" align="center" colspan="3" |'''[[Other Dry Etcher Recipes|Other Dry Etchers]]'''
+! bgcolor="#D0E7FF" align="center" colspan="3" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
 |-
 ! width="65" bgcolor="#D0E7FF" align="center" | '''Material'''