Difference between revisions of "Dry Etching Recipes"

Revision as of 14:58, 9 July 2015

R = Recipe is available. Clicking this link will take you to the recipe.

Dry Etching Recipes
	RIE Etching				ICP Etching				Oxygen Plasma Systems				Other Dry Etchers
Material	RIE 1 (Custom)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PTI/Bosch)	ICP Etch 1 (Panasonic 1)	ICP Etch 2 (Panasonic 2)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Al						R	R
Ti						R	A
Cr				A		R	A
Ge
Ag
Ru
Mo
Ta
W-TiW						R	A
Al₂O₃
HfO₂
ITO		R
SiO₂						R	R							R
SiN						R	R
SiOxNy
Ta₂O₅
TiO₂
TiN
ZnO₂
ZrO₂
GaAs				R		R	R	R
AlGaAs				R		R		R
InGaAlAs		R						R
InGaAsP		R
InP		R						R
GaN				R		R		R
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdZnTe		R
ZnSe
Si					R								R
SiC						R	A
Sapphire						R	A
Material	RIE 1 (Custom)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PlasmaTherm/Bosch Etch)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)

@@ Line 25: / Line 25: @@
 | width="85" bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 | width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
-| width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch|CAIBE<br>(Oxford)]]
+| width="85" bgcolor="#DAF1FF" | [[CAIBE (Oxford Ion Mill)|CAIBE<br>(Oxford)]]
 |-bgcolor ="#EEFFFF"
 ! bgcolor="#D0E7FF" align="center" | Al
@@ Line 671: / Line 671: @@
 | bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 | bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
-| bgcolor="#DAF1FF" | [[Vapor HF Etch|CAIBE<br>(Oxford)]]
+| bgcolor="#DAF1FF" | [[CAIBE (Oxford Ion Mill)|CAIBE<br>(Oxford)]]
 |}