Difference between revisions of "Dry Etch"
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(Created page with "Currently the Nanofab has the following '''{{PAGENAME}}''' tools. Please click on the tool for more information. * RIE 1 * RIE 2 * RIE 3 * RIE 5 * [[Si Deep RIE]…") |
(Redirected page to Tool List#Dry Etch) |
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+ | #redirect [[Tool_List#Dry Etch]] |
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− | Currently the Nanofab has the following '''{{PAGENAME}}''' tools. Please click on the tool for more information. |
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− | * [[RIE 1]] |
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− | * [[RIE 2]] |
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− | * [[RIE 3]] |
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− | * [[RIE 5]] |
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− | * [[Si Deep RIE]] |
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− | * [[Ashers]] |
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− | * [[VLR Etch]] |
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− | * [[ICP Etch 1]] |
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− | * [[ICP Etch 2]] |
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− | * [[UV Ozone Reactor]] |
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− | * [[Plasma Clean]] |
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− | * [[XeF2 Etch]] |
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− | * [[Plasma Activation Tool]] |
Latest revision as of 18:00, 27 June 2012
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