Automated Coat/Develop System (S-Cubed Flexi)

From UCSB Nanofab Wiki
Revision as of 16:03, 8 October 2019 by John d (talk | contribs) (added notice abotu staff use only)
Jump to navigation Jump to search
Automated Coat/Develop System (S-Cubed Flexi)
TBD.jpg
Tool Type Lithography
Location Bay 7
Supervisor Tony Bosch
Supervisor Phone (805) 893-3486
Supervisor E-Mail bosch@ece.ucsb.edu
Description Automatic Coat/Bake/Develop
Manufacturer S-Cubed
Lithography Recipes


This tool is only available for Staff use at this time.

About

To Be Added

Detailed Specifications

  • Wafer Size: 100mm (150mm possible but not set up)
  • PR Coating Properties:
    • Uniformity < 1.0%
    • < 100 particles on 100mm wafer
  • Photoresists/Underlayers Available:
    • UV6-0.8
    • DS-K101-304
    • PMMA
    • PMGI SF11
    • PMGI SF5
  • Solvents Available:
    • EBR100
  • Developers Available:
    • AZ 300 MiF

Process Information

Operating Procedures

  • To Be Added