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Showing below up to 50 results in range #1 to #50.
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- (hist) Publications - 2013-2014 [102,378 bytes]
- (hist) Lab Rules [80,380 bytes]
- (hist) PubList2018 [78,929 bytes]
- (hist) Old Deposition Data - NastaziaM 2021-11-22 [36,993 bytes]
- (hist) GCA 6300 training manual -old instructions [35,770 bytes]
- (hist) Lab Rules backup [35,139 bytes]
- (hist) Wafer scanning process traveler [34,065 bytes]
- (hist) Old Deposition Data - 2021-12-15 [31,421 bytes]
- (hist) ICP Etching Recipes [28,398 bytes]
- (hist) Frequently Asked Questions [25,692 bytes]
- (hist) Vacuum Deposition Recipes [24,066 bytes]
- (hist) Lithography Recipes [23,636 bytes]
- (hist) Chemical List - OLD 2018-09-05 [19,940 bytes]
- (hist) Editing Tutorials [18,259 bytes]
- (hist) Deposition Data - temporary 2021-12-15 [17,583 bytes]
- (hist) Stepper Recipes [17,366 bytes]
- (hist) Calculators + Utilities [16,377 bytes]
- (hist) Sputtering Recipes [16,213 bytes]
- (hist) MLA150 - Troubleshooting [15,471 bytes]
- (hist) Stepper 1 (GCA 6300) - Standard Operating Procedure [14,869 bytes]
- (hist) PECVD Recipes [14,124 bytes]
- (hist) Dry Etching Recipes [14,072 bytes]
- (hist) Wet Benches [13,520 bytes]
- (hist) Programming a Job [12,807 bytes]
- (hist) Glossary [12,789 bytes]
- (hist) MLA150 - Design Guidelines [12,637 bytes]
- (hist) ADT 7100 - Initial Setup Before Cutting [11,605 bytes]
- (hist) UCSB NanoFab Microscope Training [10,875 bytes]
- (hist) GCA 6300 Mask Making Guidance [10,484 bytes]
- (hist) ASML Stepper 3 - UCSB Test Reticles [10,171 bytes]
- (hist) Stepper 3 (ASML DUV) [9,987 bytes]
- (hist) Filmetrics F50 - Operating Procedure [9,961 bytes]
- (hist) Wet Etching Recipes [9,931 bytes]
- (hist) Services [9,841 bytes]
- (hist) Microscopes [9,822 bytes]
- (hist) Process Group - Process Control Data [9,813 bytes]
- (hist) Packaging Recipes [9,760 bytes]
- (hist) Stocked Chemical List [9,733 bytes]
- (hist) ASML 5500 Mask Making Guidelines [9,519 bytes]
- (hist) GoPro Hero8 Black (Internal) [9,508 bytes]
- (hist) Contact Alignment Recipes [9,006 bytes]
- (hist) ASML Stepper 3 Standard Operating Procedure [8,896 bytes]
- (hist) ASML Stepper 3 Error Recovery, Troubleshooting and Calibration [8,656 bytes]
- (hist) Oxford ICP Etcher - Process Control Data [8,520 bytes]
- (hist) Laser Etch Monitoring [8,426 bytes]
- (hist) E-Beam Evaporation Recipes [8,005 bytes]
- (hist) Atomic Layer Deposition Recipes [7,503 bytes]
- (hist) Tool List [7,420 bytes]
- (hist) KLayout Design Tips [7,390 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4 [7,016 bytes]