MVD - Wafer Coating - Process Traveler

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Non-stick FDTS coating on the MVD

Used to make the wafer surface hydrophobic, used in nanoimprinting for coating the imprint master.

Use vapor coating in a clean-dry environment process as follows:

  1. Use Technics PEII etcher for 2 minutes with O2 at 0.300T/100W first to “activate” the silicon surface for reaction with the FDTS.
  2. Use Standard FDTS program on the MVD tool for this.
  3. Hot plate bake at ~100C for 2 minutes following deposition.
    1. H2O Contact Angle ~ 110 Degrees (measured with Goniometer)

Removal: of FDTS Coating

Technics PEii O2 etching removes this coating effectively, eg. 2min at the standard 0.300T/100W.