Vacuum Deposition Recipes

From UCSB Nanofab Wiki
Revision as of 11:34, 2 July 2012 by Zwarburg (talk | contribs) (Created page with "{| border="1" class="collapsible wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" |-bgcolor="#D0E7FF" ! colspan=18 height=45 width=1575|…")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search
Vacuum Deposition Recipes

E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD)
Atomic Layer Deposition Ion-Beam Deposition (IBD) Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3 Sputter 4 Sputter 5 (Lesker AXXIS) Thermal 1 Thermal 2 PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD
Ag
Al
















Al2O3
AlN
















Au
B
















Co
Cr
















Cu
Fe
















Ge
Hf
















HfO2
In
















Ir
ITO
Mo
Bn
Ni
Pd
Pt
Ru
Si
SiN
SiO2
SiOxNy
Sn
SrF2
Ta
Ta2O5
Ti
TiN
TiO2
V
W
Zn
ZnO2
Zr
ZrO2