Difference between revisions of "Vacuum Deposition Recipes"

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Revision as of 11:17, 7 September 2012

Y = Recipe, A = Avaliable


Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Tool) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Tool) Molecular Vapor Deposition (Tool)
Ag A
A A












Al A
A A












Al2O3 A A












R
AlN














R
Au A
A A












B
















Co


A












Cr


A












Cu
















Fe


A












Ge A
A A












Hf


A












HfO2














R
In
















Ir


A












ITO
A














Mo
















Nb
















Ni A
A A












Pd A
A A












Pt A
A A












Ru


A












Si
A A













SiN A







R

R R R

SiO2
A






R

R R R R
SiOxNy
A














Sn
















SrF2
A














Ta
















Ta2O5


A




R






Ti A
A A












TiN
















TiO2
A














V
















W
















Zn
















ZnO2
















Zr


A












ZrO2














R
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Tool) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Tool) Molecular Vapor Deposition (Tool)
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