Difference between revisions of "Vacuum Deposition Recipes"
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| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]] |
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]] |
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| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]] |
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]] |
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− | | width="65" bgcolor="#daf1ff" |[https:// |
+ | | width="65" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_5_.28AJA_ATC_2200-V.29 Sputter 5 (AJA ATC 2200-V)] |
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]] |
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]] |
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| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]] |
| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]] |
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Al2O3 Deposition (Sputter 4)}} |
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+ | | bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Al2O3_deposition_.28IBD.29 R] |
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+ | | bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R] |
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|{{rl|PECVD Recipes|SiN deposition (PECVD #1)}} |
|{{rl|PECVD Recipes|SiN deposition (PECVD #1)}} |
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− | |{{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}} |
+ | |{{rl|PECVD Recipes|SiN 250C deposition (Unaxis VLR)}} |
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+ | !SiN - Low Stress |
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+ | !{{rl|PECVD Recipes|Low-Stress SiN - LS-SiN (PECVD#1)}} |
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+ | !{{rl|PECVD Recipes|Low-Stress SiN deposition (PECVD #2)}} |
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+ | !{{rl|PECVD Recipes|SiN LS 250C Deposition (Unaxis VLR)}} |
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! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub> |
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| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}} |
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}} |
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+ | | bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 LDR 250C Deposition (Unaxis VLR)}} |
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}} |
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}} |
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|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
Revision as of 10:49, 12 January 2021
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.