Difference between revisions of "Vacuum Deposition Recipes"

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| bgcolor="EEFFFF" | {{Rl|Sputtering Recipes|TiO2 deposition (Sputter 2)}}
 
| bgcolor="EEFFFF" | {{Rl|Sputtering Recipes|TiO2 deposition (Sputter 2)}}
 
| bgcolor="EEFFFF" | [[Sputtering Recipes|A]]
 
| bgcolor="EEFFFF" | [[Sputtering Recipes|A]]
| bgcolor="EEFFFF" | [[Sputtering Recipes|A]] {{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)|TiO<sub>2</sub> Deposition (Sputter 4)}}}
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| bgcolor="EEFFFF" | [[Sputtering Recipes|A]] {{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)|TiO<sub>2</sub> Deposition (Sputter 4)}}
 
| bgcolor="EEFFFF" | <br>
 
| bgcolor="EEFFFF" | <br>
 
| bgcolor="EEFFFF" | [[Sputtering_Recipes#TiO2_deposition_.28IBD.29|R]]
 
| bgcolor="EEFFFF" | [[Sputtering_Recipes#TiO2_deposition_.28IBD.29|R]]

Revision as of 11:18, 14 August 2017

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Vacuum Deposition Recipes

E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD)
Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3
(ATC 2000-F)
Sputter 4
(ATC 2200-V)
Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAL) Molecular Vapor Deposition (Tool)
Ag A
A A

A A








Al A
A A
R A R

A A




Al2O3 A A



A A
A




R
AlN




R A A
A




R
Au A
A A
R A R

A A




B
















CeO2
R














Co A

A

R









Cr A

A

R


A A




Cu A




A R A








Fe A

A

R









Ge A
A A

A A








GeO2 A
Gd A

A












Hf A















HfO2





A A






R
In










A




Ir A















ITO
R



A A
A






MgF2 A A
MgO A
Mo A




R A








Nb A





R








Nd





A








Ni A
A A

R


A A




NiCr A A
NiFe A A A
Pd A
A A





A A




Pt A
A A

A R






R
Ru A

A












Si
A



A A




R R

SiN





R A
R

R R R

SiO2 A A



R A A R

R R R R
SiOxNy








A

R



Sn










A




SrF2
A














Ta A




R A








Ta2O5


A




R






Ti A
A A

A R R








TiN




A
R
A




R
TiW A




A R








TiO2
A


R A A R
R




R
V





A A








W A




A R








Zn









A A




ZnO














R
Zr A

A

A A








ZrO2














R
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3
(ATC 2000-F)
Sputter 4
(ATC 2200-V)
Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAl) Molecular Vapor Deposition (Tool)