Unaxis VLR Etch - Process Control Data
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 Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Data - InP Ridge Etch (Unaxis VLR)
PECVD SiO2 hardmask, patterned on Stepper #2 (AutoStep 200) & Panasonic ICP #1
| InP Ridge Etch: TO BE ADDED
Sample Size: EXAMPLE: 1x1cm, ~30-40% SiO2 masking (NingC's pattern). Silicon carrier, no adhesive. | |||||
| Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (InP/SiO2) | Comments | SEM Images |
| 1/26/22 | EXAMPLE ONLY | ~400nm | 240 nm left | ~30-40% SiO2 masking (NingC's pattern) | |