Unaxis VLR Etch - Process Control Data

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Data - InP Ridge Etch (Unaxis VLR)

PECVD SiO2 hardmask, patterned on Stepper #2 (AutoStep 200) & Panasonic ICP #1

InP Ridge Etch: °C, mT, W/W, Cl2=, H2=, CH4=sccm, time=1min30sec (90sec) Sample Size: 1x1cm, ~30-40% SiO2 masking (NingC's pattern). Silicon carrier, no adhesive.
Date	Sample#	Etch Rate (nm/min)	Etch Selectivity (InP/SiO2)	Comments	SEM Images
3/30/22	NP_Unaxis_02	1413	14.6		[1] [2]
3/9/22	NP_Unaxis_01	1297	15.3		[1] [2]