Difference between revisions of "Unaxis VLR Etch - Process Control Data"
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(→Data - InP Ridge Etch (Unaxis VLR): updated chamber conditioning) |
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|[https://wiki.nanotech.ucsb.edu/w/images/3/3e/Unaxis_01_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/71/Unaxis_01_CS_001.jpg <nowiki>[2]</nowiki>] |
|[https://wiki.nanotech.ucsb.edu/w/images/3/3e/Unaxis_01_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/71/Unaxis_01_CS_001.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |11/8/2021 |
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+ | |InP#2102 |
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+ | |1.24 |
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+ | |13.8 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/4/45/IP210201.pdf][https://wiki.nanotech.ucsb.edu/w/images/4/49/IP210212.pdf] |
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+ | |- |
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+ | |2/3/2021 |
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+ | |InP#2101 |
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+ | |1.30 |
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+ | |16 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf][https://wiki.nanotech.ucsb.edu/w/images/d/d4/IP210119.pdf] |
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+ | |- |
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+ | |8/30/2020 |
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+ | |InP#2001 |
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+ | |1.11 |
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+ | |10.4 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/8/8d/IP020104.pdf] |
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+ | |- |
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+ | |1/31/2019 |
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+ | |InP#1901 |
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+ | |0.88 |
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+ | |9.7 |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/b/b7/IP190101.pdf][https://wiki.nanotech.ucsb.edu/wiki/images/0/06/IP190103.pdf] |
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+ | |- |
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+ | |12/10/2018 |
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+ | |InP#1809 |
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+ | |1.01 |
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+ | |11.4 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/8/84/IP180909.pdf] |
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+ | |- |
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+ | |10/3/2018 |
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+ | |InP#1808 |
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+ | |1.01 |
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+ | |13.7 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/e/e5/IP180805.pdf] |
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+ | |- |
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+ | |8/7/2018 |
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+ | |InP#1807 |
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+ | |0.81 |
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+ | |8.0 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/f/fb/IP180705.pdf] |
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+ | |- |
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+ | |5/22/2018 |
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+ | |InP#1806 |
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+ | |0.88 |
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+ | |8.4 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/e/e1/IP180606.pdf] |
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+ | |- |
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+ | |4/26/2018 |
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+ | |InP#1805 |
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+ | |1.29 |
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+ | |13.6 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/c/c8/IP180508.pdf] |
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+ | |- |
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+ | |4/10/2018 |
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+ | |InP#1804 |
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+ | |1.12 |
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+ | |12.8 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/1/17/IP180406.pdf] |
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+ | |- |
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+ | |4/5/2018 |
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+ | |InP#1803 |
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+ | |1.05 |
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+ | |11.9 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/c/c7/IP180304.pdf] |
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+ | |- |
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+ | |3/1/2018 |
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+ | |InP#1802 |
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+ | |0.96 |
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+ | |9 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/6/65/IP180207.pdf] |
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+ | |- |
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+ | |1/2/2018 |
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+ | |InP#1801 |
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+ | |1.44 |
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+ | |14.3 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/0/0d/IP180104.pdf] |
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+ | |- |
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+ | |12/7/2017 |
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+ | |InP#1714 |
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+ | |0.96 |
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+ | |10.4 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/0/03/IP173306.pdf] |
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+ | |- |
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+ | |11/21/2017 |
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+ | |InP#1713 |
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+ | |1.04 |
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+ | |12.1 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/0/02/IP173203.pdf] |
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+ | |- |
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+ | |10/23/2017 |
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+ | |InP#1712 |
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+ | |1.11 |
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+ | |13.1 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/4/41/IP173107.pdf] |
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+ | |- |
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+ | |10/11/2017 |
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+ | |InP#1711 |
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+ | |1 |
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+ | |11 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/9/97/IP173009.pdf] |
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+ | |- |
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+ | |8/28/2017 |
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+ | |InP#1710 |
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+ | |1 |
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+ | |11.7 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/a/aa/IP172905.pdf] |
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+ | |- |
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+ | |8/16/2017 |
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+ | |InP#1709 |
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+ | |0.76 |
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+ | |8 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/f/fa/IP172805.pdf] |
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+ | |- |
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+ | |7/6/2017 |
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+ | |InP#1708 |
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+ | |0.98 |
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+ | |12.1 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/a/ac/IP172520.pdf] |
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+ | |- |
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+ | |5/19/2017 |
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+ | |InP#1707 |
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+ | |0.82 |
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+ | |9.9 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/7/7f/IP170706.pdf] |
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+ | |- |
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+ | |5/4/2017 |
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+ | |InP#1706 |
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+ | |0.84 |
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+ | |11 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/d/d1/IP170603.pdf] |
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+ | |- |
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+ | |4/20/2017 |
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+ | |inP#1705 |
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+ | |0.88 |
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+ | |10.2 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/5/5b/IP170505.pdf] |
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+ | |- |
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+ | |3/21/2017 |
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+ | |InP#1704 |
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+ | |1.01 |
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+ | |11.3 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/f/fd/IP170404.pdf] |
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+ | |- |
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+ | |2/21/2017 |
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+ | |InP#1703 |
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+ | |0.91 |
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+ | |11.3 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/b/b8/IP170302.pdf] |
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+ | |- |
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+ | |2/7/2017 |
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+ | |InP#1702 |
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+ | |0.75 |
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+ | |7.7 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/2/2f/IP170208.pdf] |
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+ | |- |
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+ | |1/23/2017 |
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+ | |InP#1701 |
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+ | |0.93 |
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+ | |9.4 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/7/7f/IP170106.pdf] |
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+ | |- |
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+ | |12/15/2016 |
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+ | |InP#1615 |
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+ | |0.91 |
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+ | |9.3 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/6/64/IP161510.pdf] |
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+ | |- |
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+ | |12/1/2016 |
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+ | |InP#1614 |
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+ | |0.96 |
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+ | |12.1 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/e/ed/IP161421.pdf] |
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+ | |- |
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+ | |10/4/2016 |
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+ | |InP#1613 |
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+ | |0.92 |
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+ | |8.9 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/9/9b/IP161332.pdf] |
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Revision as of 11:08, 27 April 2022
Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Data - InP Ridge Etch (Unaxis VLR)
PECVD SiO2 hardmask, patterned on Stepper #2 (AutoStep 200) & Panasonic ICP #1
InP Ridge Etch: 200°C, 1.4mT, 800W/125W, Cl2=6.3, H2=12.7, Ar=2.0 sccm, time=1min30sec (90sec)
Sample Size: 1x1cm epi-grade InP, ~30-40% SiO2 masking (NingC's pattern). Silicon carrier, no adhesive. Conditioning: Prior to the etch, do O2 clean 15 minutes, then, chamber coating with the same recipe on 1/4-2" InP on Silicon carrier for 15 minutes. | |||||
Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (InP/SiO2) | Comments | SEM Images |
3/30/22 | NP_Unaxis_02 | 1413 | 14.6 | [1] [2] | |
3/9/22 | NP_Unaxis_01 | 1297 | 15.3 | [1] [2] | |
11/8/2021 | InP#2102 | 1.24 | 13.8 | [1][2] | |
2/3/2021 | InP#2101 | 1.30 | 16 | [3][4] | |
8/30/2020 | InP#2001 | 1.11 | 10.4 | [5] | |
1/31/2019 | InP#1901 | 0.88 | 9.7 | [6][7] | |
12/10/2018 | InP#1809 | 1.01 | 11.4 | [8] | |
10/3/2018 | InP#1808 | 1.01 | 13.7 | [9] | |
8/7/2018 | InP#1807 | 0.81 | 8.0 | [10] | |
5/22/2018 | InP#1806 | 0.88 | 8.4 | [11] | |
4/26/2018 | InP#1805 | 1.29 | 13.6 | [12] | |
4/10/2018 | InP#1804 | 1.12 | 12.8 | [13] | |
4/5/2018 | InP#1803 | 1.05 | 11.9 | [14] | |
3/1/2018 | InP#1802 | 0.96 | 9 | [15] | |
1/2/2018 | InP#1801 | 1.44 | 14.3 | [16] | |
12/7/2017 | InP#1714 | 0.96 | 10.4 | [17] | |
11/21/2017 | InP#1713 | 1.04 | 12.1 | [18] | |
10/23/2017 | InP#1712 | 1.11 | 13.1 | [19] | |
10/11/2017 | InP#1711 | 1 | 11 | [20] | |
8/28/2017 | InP#1710 | 1 | 11.7 | [21] | |
8/16/2017 | InP#1709 | 0.76 | 8 | [22] | |
7/6/2017 | InP#1708 | 0.98 | 12.1 | [23] | |
5/19/2017 | InP#1707 | 0.82 | 9.9 | [24] | |
5/4/2017 | InP#1706 | 0.84 | 11 | [25] | |
4/20/2017 | inP#1705 | 0.88 | 10.2 | [26] | |
3/21/2017 | InP#1704 | 1.01 | 11.3 | [27] | |
2/21/2017 | InP#1703 | 0.91 | 11.3 | [28] | |
2/7/2017 | InP#1702 | 0.75 | 7.7 | [29] | |
1/23/2017 | InP#1701 | 0.93 | 9.4 | [30] | |
12/15/2016 | InP#1615 | 0.91 | 9.3 | [31] | |
12/1/2016 | InP#1614 | 0.96 | 12.1 | [32] | |
10/4/2016 | InP#1613 | 0.92 | 8.9 | [33] |