Difference between revisions of "Unaxis VLR Etch - Process Control Data"

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(pasted table from Oxford ICP)
 
(comments on undercut profile from 3/29/22)
(7 intermediate revisions by 2 users not shown)
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[[PECVD1-(PlasmaTherm 790)|PECVD SiO2]] hardmask, patterned on [[Stepper 1 (GCA 6300)|Stepper #2 (AutoStep 200)]] & [[ICP Etch 1 (Panasonic E626I)|Panasonic ICP #1]]
 
[[PECVD1-(PlasmaTherm 790)|PECVD SiO2]] hardmask, patterned on [[Stepper 1 (GCA 6300)|Stepper #2 (AutoStep 200)]] & [[ICP Etch 1 (Panasonic E626I)|Panasonic ICP #1]]
 
{| class="wikitable"
  
{| class="wikitable"
−
| colspan="6" |'''InP Ridge Etch''': 60°C, 3mT, 800W/65W, Cl2=18, H2=15, CH4=10sccm, time=5min00sec (300sec)
 +
| colspan="6" |'''InP Ridge Etch''': 200°C, 1.4mT, 800W/125W, Cl<sub>2</sub>=6.3, H<sub>2</sub>=12.7, Ar=2.0 sccm, time=1min30sec (90sec)
−
Sample Size: 1x1cm, ~30-40% SiO<sub>2</sub> masking (NingC's pattern). Silicon carrier, no adhesive.
 +
''Sample Size:'' 1x1cm epi-grade InP, ~30-40% SiO<sub>2</sub> masking (NingC's pattern). Silicon carrier, no adhesive.
  +
  +
''Conditioning:'' Prior to the etch, do O2 clean 15 minutes, then, chamber coating with the same recipe on 1/4-2" InP on Silicon carrier for 15 minutes.
 
|-
  
|-
 
|Date
  
|Date
Line 11: Line 13:
 
|Comments
  
|Comments
 
|SEM Images
  
|SEM Images
  +
|-
  +
|4/28/22
  +
|NP_Unaxis_03
  +
|1.51
  +
|22.2
  +
|Normal profile - vertical and smooth.
  +
|[https://wiki.nanotech.ucsb.edu/w/images/a/ae/Unaxis_03_45D_003.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a8/Unaxis_03_CS_003.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
 
|3/30/22
  
|3/30/22
  +
|NP_Unaxis_02
−
|NP_60c_004
  
  +
|1.41
−
|427
  
−
|11.17
 +
|14.6
  +
|Strong undercut!
−
|*etched for 3min*
  
−
|[https://wiki.nanotech.ucsb.edu/w/images/8/8a/Oxford_60c_04_45D_001.jpg <nowiki>[1]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/0/0a/Oxford_60c_04_CS_004.jpg <nowiki>[2]</nowiki>]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/8/84/Unaxis_02_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/6/60/Unaxis_02_CS_002.jpg <nowiki>[2]</nowiki>]
  +
|-
  +
|3/9/22
  +
|NP_Unaxis_01
  +
|1.30
  +
|15.3
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/w/images/3/3e/Unaxis_01_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/71/Unaxis_01_CS_001.jpg <nowiki>[2]</nowiki>]
  +
|-
  +
|11/8/2021
  +
|InP#2102
  +
|1.24
  +
|13.8
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/w/images/4/45/IP210201.pdf][https://wiki.nanotech.ucsb.edu/w/images/4/49/IP210212.pdf]
  +
|-
  +
|2/3/2021
  +
|InP#2101
  +
|1.30
  +
|16
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf][https://wiki.nanotech.ucsb.edu/w/images/d/d4/IP210119.pdf]
  +
|-
  +
|8/30/2020
  +
|InP#2001
  +
|1.11
  +
|10.4
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/w/images/8/8d/IP020104.pdf]
  +
|-
  +
|1/31/2019
  +
|InP#1901
  +
|0.88
  +
|9.7
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b7/IP190101.pdf][https://wiki.nanotech.ucsb.edu/wiki/images/0/06/IP190103.pdf]
  +
|-
  +
|12/10/2018
  +
|InP#1809
  +
|1.01
  +
|11.4
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/8/84/IP180909.pdf]
  +
|-
  +
|10/3/2018
  +
|InP#1808
  +
|1.01
  +
|13.7
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/e5/IP180805.pdf]
  +
|-
  +
|8/7/2018
  +
|InP#1807
  +
|0.81
  +
|8.0
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/f/fb/IP180705.pdf]
  +
|-
  +
|5/22/2018
  +
|InP#1806
  +
|0.88
  +
|8.4
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/e1/IP180606.pdf]
  +
|-
  +
|4/26/2018
  +
|InP#1805
  +
|1.29
  +
|13.6
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/c/c8/IP180508.pdf]
  +
|-
  +
|4/10/2018
  +
|InP#1804
  +
|1.12
  +
|12.8
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/1/17/IP180406.pdf]
  +
|-
  +
|4/5/2018
  +
|InP#1803
  +
|1.05
  +
|11.9
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/c/c7/IP180304.pdf]
  +
|-
  +
|3/1/2018
  +
|InP#1802
  +
|0.96
  +
|9
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/6/65/IP180207.pdf]
  +
|-
  +
|1/2/2018
  +
|InP#1801
  +
|1.44
  +
|14.3
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/0/0d/IP180104.pdf]
  +
|-
  +
|12/7/2017
  +
|InP#1714
  +
|0.96
  +
|10.4
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/0/03/IP173306.pdf]
  +
|-
  +
|11/21/2017
  +
|InP#1713
  +
|1.04
  +
|12.1
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/0/02/IP173203.pdf]
  +
|-
  +
|10/23/2017
  +
|InP#1712
  +
|1.11
  +
|13.1
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/4/41/IP173107.pdf]
  +
|-
  +
|10/11/2017
  +
|InP#1711
  +
|1
  +
|11
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/9/97/IP173009.pdf]
  +
|-
  +
|8/28/2017
  +
|InP#1710
  +
|1
  +
|11.7
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/a/aa/IP172905.pdf]
  +
|-
  +
|8/16/2017
  +
|InP#1709
  +
|0.76
  +
|8
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/f/fa/IP172805.pdf]
  +
|-
  +
|7/6/2017
  +
|InP#1708
  +
|0.98
  +
|12.1
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/a/ac/IP172520.pdf]
  +
|-
  +
|5/19/2017
  +
|InP#1707
  +
|0.82
  +
|9.9
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/7/7f/IP170706.pdf]
  +
|-
  +
|5/4/2017
  +
|InP#1706
  +
|0.84
  +
|11
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/d/d1/IP170603.pdf]
  +
|-
  +
|4/20/2017
  +
|inP#1705
  +
|0.88
  +
|10.2
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/5/5b/IP170505.pdf]
  +
|-
  +
|3/21/2017
  +
|InP#1704
  +
|1.01
  +
|11.3
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/f/fd/IP170404.pdf]
  +
|-
  +
|2/21/2017
  +
|InP#1703
  +
|0.91
  +
|11.3
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b8/IP170302.pdf]
  +
|-
  +
|2/7/2017
  +
|InP#1702
  +
|0.75
  +
|7.7
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/2/2f/IP170208.pdf]
  +
|-
  +
|1/23/2017
  +
|InP#1701
  +
|0.93
  +
|9.4
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/7/7f/IP170106.pdf]
  +
|-
  +
|12/15/2016
  +
|InP#1615
  +
|0.91
  +
|9.3
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/6/64/IP161510.pdf]
 
|-
  
|-
−
|1/26/22
 +
|12/1/2016
  +
|InP#1614
−
|NP_1_26_003
  
  +
|0.96
−
|452
  
  +
|12.1
−
|260-280nm left
  
  +
|
−
|~30-40% SiO<sub>2</sub> masking (NingC's pattern)
  
−
|[https://wiki.nanotech.ucsb.edu/w/images/e/ef/Oxford_Cal_01_26_22_003New_45d_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/4/40/Oxford_Cal_01_26_22_031New_CS_001.jpg <nowiki>[2]</nowiki>]
 +
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/ed/IP161421.pdf]
 
|-
  
|-
−
|1/26/22
 +
|10/4/2016
  +
|InP#1613
−
|<small>NP_1_26_001</small>
  
  +
|0.92
−
|~400nm
  
  +
|8.9
−
|240 nm left
  
  +
|
−
|~30-40% SiO<sub>2</sub> masking (NingC's pattern)
  
−
|[https://wiki.nanotech.ucsb.edu/w/images/d/dc/Oxford_Cal_1_26_22_001_45D_005.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/8/87/Oxford_Cal_1_26_22_001_CS_004.jpg <nowiki>[2]</nowiki>]
 +
|[https://wiki.nanotech.ucsb.edu/wiki/images/9/9b/IP161332.pdf]
 
|}
  
|}

Revision as of 14:27, 28 April 2022

Data - InP Ridge Etch (Unaxis VLR)

PECVD SiO2 hardmask, patterned on Stepper #2 (AutoStep 200) & Panasonic ICP #1

InP Ridge Etch: 200°C, 1.4mT, 800W/125W, Cl2=6.3, H2=12.7, Ar=2.0 sccm, time=1min30sec (90sec)

Sample Size: 1x1cm epi-grade InP, ~30-40% SiO2 masking (NingC's pattern). Silicon carrier, no adhesive.

Conditioning: Prior to the etch, do O2 clean 15 minutes, then, chamber coating with the same recipe on 1/4-2" InP on Silicon carrier for 15 minutes.

Date Sample# Etch Rate (nm/min) Etch Selectivity (InP/SiO2) Comments SEM Images
4/28/22 NP_Unaxis_03 1.51 22.2 Normal profile - vertical and smooth. [1] [2]
3/30/22 NP_Unaxis_02 1.41 14.6 Strong undercut! [1] [2]
3/9/22 NP_Unaxis_01 1.30 15.3 [1] [2]
11/8/2021 InP#2102 1.24 13.8 [1][2]
2/3/2021 InP#2101 1.30 16 [3][4]
8/30/2020 InP#2001 1.11 10.4 [5]
1/31/2019 InP#1901 0.88 9.7 [6][7]
12/10/2018 InP#1809 1.01 11.4 [8]
10/3/2018 InP#1808 1.01 13.7 [9]
8/7/2018 InP#1807 0.81 8.0 [10]
5/22/2018 InP#1806 0.88 8.4 [11]
4/26/2018 InP#1805 1.29 13.6 [12]
4/10/2018 InP#1804 1.12 12.8 [13]
4/5/2018 InP#1803 1.05 11.9 [14]
3/1/2018 InP#1802 0.96 9 [15]
1/2/2018 InP#1801 1.44 14.3 [16]
12/7/2017 InP#1714 0.96 10.4 [17]
11/21/2017 InP#1713 1.04 12.1 [18]
10/23/2017 InP#1712 1.11 13.1 [19]
10/11/2017 InP#1711 1 11 [20]
8/28/2017 InP#1710 1 11.7 [21]
8/16/2017 InP#1709 0.76 8 [22]
7/6/2017 InP#1708 0.98 12.1 [23]
5/19/2017 InP#1707 0.82 9.9 [24]
5/4/2017 InP#1706 0.84 11 [25]
4/20/2017 inP#1705 0.88 10.2 [26]
3/21/2017 InP#1704 1.01 11.3 [27]
2/21/2017 InP#1703 0.91 11.3 [28]
2/7/2017 InP#1702 0.75 7.7 [29]
1/23/2017 InP#1701 0.93 9.4 [30]
12/15/2016 InP#1615 0.91 9.3 [31]
12/1/2016 InP#1614 0.96 12.1 [32]
10/4/2016 InP#1613 0.92 8.9 [33]
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