Difference between revisions of "UV Ozone Reactor"
Jump to navigation
Jump to search
(Created page with "{{tool|{{PAGENAME}} |picture=Ozone.jpg |type = Dry Etch |super= Tony Bosch |location=Bay 5 |description = ? |manufacturer = ? }} = About =") |
(Text replacement - "www.nanotech.ucsb.edu/wiki/" to "wiki.nanotech.ucsb.edu/wiki/") |
||
| (5 intermediate revisions by 2 users not shown) | |||
| Line 2: | Line 2: | ||
|picture=Ozone.jpg |
|picture=Ozone.jpg |
||
|type = Dry Etch |
|type = Dry Etch |
||
| − | |super= |
+ | |super= Lee Sawyer |
| + | |model=M-144AX |
||
|location=Bay 5 |
|location=Bay 5 |
||
| − | |description = |
+ | |description = UV Ozone Reactor |
| − | |manufacturer = |
+ | |manufacturer = Jelight |
}} |
}} |
||
| − | = |
+ | ==About== |
| + | The UV Ozone is manufactured by Jelight, model M-144AX. It can be used for Oxygen activation, etching or oxidation of a surface without ion bombardment. |
||
| + | |||
| + | ==Documentation== |
||
| + | |||
| + | *[[UV Ozone Quick Start|Quick Start]] |
||
| + | *[//wiki.nanotech.ucsb.edu/wiki/images/7/79/UV_Ozone_Manual_Jelight_M-144AX.pdf UV Ozone Manual] |
||
Revision as of 18:29, 6 April 2020
| ||||||||||||||||||||||
About
The UV Ozone is manufactured by Jelight, model M-144AX. It can be used for Oxygen activation, etching or oxidation of a surface without ion bombardment.