Tube Furnace (Tystar 8300)
The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each:
- Dry or wet oxidation of silicon
- Dry or wet oxidation of AlGaAs (or other materials)
- General furnace annealing
The tubes can hold up to twenty-five 8” wafers per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system. Gases used are O2, Steam from DI-H2O, N2.
Under the “ambient” variable use the following:
- Wet – 0.945
- Dry – 1.298
These numbers will give accurate growth calculations.