Difference between revisions of "Tool List"
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(→Lithography: added POLOS spinners) |
m (→Lithography Support: link to POLOS section) |
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*[[Vacuum Oven (YES)]] |
*[[Vacuum Oven (YES)]] |
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− | ===== |
+ | =====Lithography Support===== |
*The [https://www.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes. |
*The [https://www.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes. |
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− | *POLOS spinners on Develop and Solvent benches |
+ | *[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 POLOS spinners] on Develop and Solvent benches |
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]] |
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]] |
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Revision as of 11:06, 19 December 2019
Lithography
Photoresists and Lithography ChemicalsContact Aligners (Optical Exposure)Other Patterning Systems |
Steppers (Optical Exposure)Thermal Processing for Photolithography
Lithography Support
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Vacuum Deposition
Physical Vapor Deposition (PVD)
Sputter Deposition |
Chemical Vapor Deposition (CVD) |
Dry Etch
Reactive Ion Etching (RIE)
Etch Monitoring
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ICP-RIE
Other Dry Etching |
Wet Processing
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.