Difference between revisions of "Tool List"

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(→‎Inspection, Test and Characterization: rearranged, moved "other properties" to end, renamed "Surfscan" to "particle counts")
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=====Optical Microscopy=====
 
=====Optical Microscopy=====
  
*[[Microscopes|Optical Microscopes]]
+
*[[Microscopes|Optical Microscopes]] - ''General Use''
 
*[[Fluorescence Microscope (Olympus MX51)]]
 
*[[Fluorescence Microscope (Olympus MX51)]]
 
*[[Deep UV Optical Microscope (Olympus)]]
 
*[[Deep UV Optical Microscope (Olympus)]]
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*[[Step Profilometer (Dektak 6M)]]
 
*[[Step Profilometer (Dektak 6M)]]
 
*[[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
 
*[[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
*[[Surface Analysis (KLA/Tencor Surfscan)]]
 
**''Sub-micron Particle Counter''
 
 
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
 
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
 
| width="400" |
 
| width="400" |
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*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
 
*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
 
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
 
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
 
======Other Properties======
 
 
*[[Film Stress (Tencor Flexus)]]
 
*[[Photoluminescence PL Setup (Custom)]]
 
  
 
======Electrical Analysis======
 
======Electrical Analysis======
  
 
*[[Resistivity Mapper (CDE RESMAP)]]
 
*[[Resistivity Mapper (CDE RESMAP)]]
*[[Probe Station & Curve Tracer]]
+
*[[Probe Station & Curve Tracer|Probe Station & Source/Meter Units]]
  
=====Other Tools=====
+
====== Other Properties ======
  
 +
*[[Film Stress (Tencor Flexus)]]
 +
*[[Surface Analysis (KLA/Tencor Surfscan)|Particle Counts (KLA/Tencor Surfscan)]]
 +
*[[Photoluminescence PL Setup (Custom)]]
 
*[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]]
 
*[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]]
 
**''Surface hydrophobicity''
 
**''Surface hydrophobicity''

Revision as of 10:29, 4 January 2022

Lithography

Photoresists and Lithography Chemicals
Contact Aligners (Optical Exposure)
Direct-Write Lithography
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography
Lithography Support

Vacuum Deposition

Physical Vapor Deposition (PVD)
Sputter Deposition
Chemical Vapor Deposition (CVD)

Dry Etch

Reactive Ion Etching (RIE)
Plasma Etching and Cleaning
Etch Monitoring
ICP-RIE
Ion Milling and Reactive Ion Beam Etching
Other Dry Etching

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Inspection, Test and Characterization

Optical Microscopy
Electron Microscopy
Topographical Metrology
Thin-Film/Material Analysis
Thickness + Optical Constants
Electrical Analysis
Other Properties