Revision as of 14:25, 3 July 2018

Lithography

You can see our available photoresists on the Chemical Datasheets page.

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

@@ Line 5: / Line 5: @@
 |- valign="top"
 | width="300" |
+===== Contact Aligners (Optical Exposure) =====
 * [[Suss Aligners (SUSS MJB-3)]]
 * [[IR Aligner (SUSS MJB-3 IR)]]
+* [[Contact Aligner (SUSS MA-6)]]
 * [[DUV Flood Expose]]
+===== Other Patterning Systems =====
+* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
+* [[Nano-Imprint (Nanonex NX2000)]]
+* [[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
+| width="400" |
+===== Steppers (Optical Exposure) =====
+* [[Stepper 1 (GCA 6300)|Stepper 1 (GCA 6300, i-line)]]
+* [[Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200, i-line)]]
+* [[Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV, Deep-UV)]]
+===== Thermal Processing for Photolithography =====
 * [[Ovens 1, 2 & 3 (Labline)]]
 * [[Oven 4 (Fisher)]]
@@ Line 13: / Line 27: @@
 * [[High Temp Oven (Blue M)]]
 * [[Vacuum Oven (YES)]]
+* The [https://www.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
-* [[Holographic Lith/PL Setup (Custom)]]
-| width="400" |
-* [[Stepper 1 (GCA 6300)]]
-* [[Stepper 2 (AutoStep 200)]]
-* [[Stepper 3 (ASML DUV)]]
-* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
-* [[Nano-Imprint (Nanonex NX2000)]]
-* [[Contact Aligner (SUSS MA-6)]]
 |-
 |}