Difference between revisions of "Tool List"

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Line 88: Line 88:
 
* [[Chemical-Mechanical Polisher (Logitech)]]
 
* [[Chemical-Mechanical Polisher (Logitech)]]
 
* [[Wet Benches]]
 
* [[Wet Benches]]
**[[Photoresist Spin Benches]]
+
**[[Acid Benches]]
 
**[[Solvent Benches]]
 
**[[Solvent Benches]]
 
**[[Lithography Development & Solvent Clean Benches]]
 
**[[Lithography Development & Solvent Clean Benches]]

Revision as of 08:21, 10 July 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization