Difference between revisions of "Tool List"
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| width="400" | |
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− | *[[ICP Etch 1 (Panasonic |
+ | *[[ICP Etch 1 (Panasonic E626I)]] |
− | *[[ICP Etch 2 (Panasonic |
+ | *[[ICP Etch 2 (Panasonic E640)]] |
*[[UV Ozone Reactor]] |
*[[UV Ozone Reactor]] |
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*[[Plasma Clean (Gasonics 2000)]] |
*[[Plasma Clean (Gasonics 2000)]] |
Revision as of 12:13, 9 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)