Difference between revisions of "Tool List"

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(→‎Wet Processing: link to Mechanical_Polisher_(Allied))
(→‎Wet Processing: link to Wafer_Toxic_Corrosive_Bench)
(19 intermediate revisions by 5 users not shown)
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=====Photoresists and Lithography Chemicals=====
  
=====Photoresists and Lithography Chemicals=====
   
−
*See the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Chemical Datasheets page].
 +
*See the [https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Chemical Datasheets page].
 
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
  
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
   
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*[[Suss Aligners (SUSS MJB-3)]]
  
*[[Suss Aligners (SUSS MJB-3)]]
⚫
*[[IR Aligner (SUSS MJB-3 IR)]]
  
 
*[[Contact Aligner (SUSS MA-6)]]
  
*[[Contact Aligner (SUSS MA-6)]]
 
*[[DUV Flood Expose]]
  
*[[DUV Flood Expose]]
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*[[Maskless Aligner (Heidelberg MLA150)]]
  
*[[Maskless Aligner (Heidelberg MLA150)]]
   
−
===== Other Patterning Systems =====
 +
=====Other Patterning Systems=====
  +
 
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
  
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
 
| width="400" |
  
| width="400" |
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*[[Oven 5 (Labline)]]
  
*[[Oven 5 (Labline)]]
 
*[[High Temp Oven (Blue M)]]
  
*[[High Temp Oven (Blue M)]]
−
*[[Vacuum Oven (YES)]]
  
   
 
=====Lithography Support=====
  
=====Lithography Support=====
   
−
*The [https://wiki.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
 +
*The [https://wiki.nanotech.ucsb.edu/w/index.php?title=Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
−
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 POLOS spinners] on Develop and Solvent benches
 +
*[https://signupmonkey.ece.ucsb.edu/w/index.php?title=Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 POLOS spinners] on Develop and Solvent benches
 
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]]
  
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]]
 
|-
  
|-
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|- valign="top"
  
|- valign="top"
 
| width="300" |
  
| width="300" |
−
=====Physical Vapor Deposition (PVD)=====
 +
====Physical Vapor Deposition (PVD)====
  +
  +
=====Thermal Evaporation=====
   
 
*[[E-Beam 1 (Sharon)]]
  
*[[E-Beam 1 (Sharon)]]
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*[[Sputter 5 (AJA ATC 2200-V)]]
  
*[[Sputter 5 (AJA ATC 2200-V)]]
 
*[[Ion Beam Deposition (Veeco NEXUS)]]
  
*[[Ion Beam Deposition (Veeco NEXUS)]]
  +
*[[SEM Sample Coater (Hummer)]]
   
 
| width="400" |
  
| width="400" |
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=====Plasma Etching and Cleaning=====
  
=====Plasma Etching and Cleaning=====
   
−
*[[Plasma Clean (Gasonics 2000)]]
  
 
*[[Plasma Clean (YES EcoClean)]]
  
*[[Plasma Clean (YES EcoClean)]]
 
*[[Plasma Activation (EVG 810)]]
  
*[[Plasma Activation (EVG 810)]]
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*[[ICP Etch 2 (Panasonic E640)]]
  
*[[ICP Etch 2 (Panasonic E640)]]
 
*[[ICP-Etch (Unaxis VLR)]]
  
*[[ICP-Etch (Unaxis VLR)]]
  +
*[[Oxford ICP Etcher (PlasmaPro 100 Cobra)]]
 
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]]
  
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]]
 
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]]
  
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]]
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*[[CAIBE (Oxford Ion Mill)]]
  
*[[CAIBE (Oxford Ion Mill)]]
  +
*[[Focused Ion-Beam Lithography (Raith Velion)]]
   
 
=====Other Dry Etching=====
  
=====Other Dry Etching=====
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**[[Develop Benches]]
  
**[[Develop Benches]]
 
**[[Toxic Corrosive Benches]]
  
**[[Toxic Corrosive Benches]]
  +
**[[Wet Benches#Wafer Toxic Corrosive Benches|Wafer Toxic Corrosive Bench]]
 
**[[HF/TMAH Processing Benches]]
  
**[[HF/TMAH Processing Benches]]
 
**[[Plating Bench]]
  
**[[Plating Bench]]
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*[[Mechanical Polisher (Allied)]]
  
*[[Mechanical Polisher (Allied)]]
 
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
  
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
−
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 Auto. Wet-Processing Spinners (POLOS)]
 +
*[https://signupmonkey.ece.ucsb.edu/w/index.php?title=Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 Auto. Wet-Processing Spinners (POLOS)]
 
|-
  
|-
 
|}
  
|}
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**[[Oven 4 (Thermo-Fisher HeraTherm)]]
  
**[[Oven 4 (Thermo-Fisher HeraTherm)]]
 
**[[Oven 5 (Labline)]]
  
**[[Oven 5 (Labline)]]
−
**[[Vacuum Oven (YES)]]
  
 
**[[High Temp Oven (Blue M)]]
  
**[[High Temp Oven (Blue M)]]
⚫
|
  
 
|-
  
|-
 
|}
  
|}
   
 
=Packaging=
  
=Packaging=
  +
{|
  ⚫
|
  +
====Die Singulation / Down-sizing====
   
 
*[[Dicing Saw (ADT)]]
  
*[[Dicing Saw (ADT)]]
  +
*[[Wafer Cleaver (PELCO Flip-Scribe)|Wafer Cleaver (PELCO Flipscribe)]]
⚫
*[[Flip-Chip Bonder (Finetech)]]
  
  +
  +
====Other Packaging====
  +
 
*[[Vacuum Sealer]]
  
*[[Vacuum Sealer]]
  ⚫
|
−
*[[Wire Saw (Takatori)]]
  
  +
====Wafer/Die Bonding====
  +
  ⚫
*[[Flip-Chip Bonder (Finetech)]]
  +
  ⚫
*[[Wafer Bonder (SUSS SB6-8E)]]
  +
*[[Wafer Bonder (Logitech WBS7)|Wafer Bonder/Wax Mounting (Logitech WBS2)]]
  ⚫
|}
   
 
=Inspection, Test and Characterization=
  
=Inspection, Test and Characterization=
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=====Optical Microscopy=====
  
=====Optical Microscopy=====
   
−
*[[Microscopes|Optical Microscopes]]
 +
*[[Microscopes|Optical Microscopes]] - ''General Use''
 
*[[Fluorescence Microscope (Olympus MX51)]]
  
*[[Fluorescence Microscope (Olympus MX51)]]
 
*[[Deep UV Optical Microscope (Olympus)]]
  
*[[Deep UV Optical Microscope (Olympus)]]
 
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
  
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
⚫
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]]
  
 
*[[Digital Microscope (Olympus DSX1000)|Digital Microscope #7 (Olympus DSX1000)]]
  
*[[Digital Microscope (Olympus DSX1000)|Digital Microscope #7 (Olympus DSX1000)]]
   
−
===== Electron Microscopy =====
 +
=====Electron Microscopy=====
  +
 
*[[Field Emission SEM 1 (FEI Sirion)]]
  
*[[Field Emission SEM 1 (FEI Sirion)]]
 
*[[Field Emission SEM 2 (JEOL 7600F)]]
  
*[[Field Emission SEM 2 (JEOL 7600F)]]
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*[[Step Profilometer (Dektak 6M)]]
  
*[[Step Profilometer (Dektak 6M)]]
 
*[[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
  
*[[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
⚫
*[[Surface Analysis (KLA/Tencor Surfscan)]]
  
−
**''Sub-micron Particle Counter''
  
 
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
  
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
 
| width="400" |
  
| width="400" |
 
=====Thin-Film/Material Analysis=====
  
=====Thin-Film/Material Analysis=====
   
−
====== Thickness + Optical Constants ======
 +
======Thickness + Optical Constants======
  +
 
*[[Ellipsometer (Woollam)]]
  
*[[Ellipsometer (Woollam)]]
−
*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
  
 
*[[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]]
  
*[[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]]
−
*[[Optical Film Thickness (Nanometric)]]
  
 
*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
  
*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
 
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
  
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
   
−
====== Other Properties ======
 +
======Electrical Analysis======
⚫
*[[Film Stress (Tencor Flexus)]]
  
⚫
*[[Photoluminescence PL Setup (Custom)]]
  
   
−
====== Electrical Analysis ======
  
 
*[[Resistivity Mapper (CDE RESMAP)]]
  
*[[Resistivity Mapper (CDE RESMAP)]]
−
*[[Probe Station & Curve Tracer]]
 +
*[[Probe Station & Curve Tracer|Probe Station & Source/Meter Units]]
  ⚫
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]]
   
−
=====Other Tools=====
 +
======Other Properties======
   
  ⚫
*[[Film Stress (Tencor Flexus)]]
  ⚫
*[[Surface Analysis (KLA/Tencor Surfscan)|Particle Counts (KLA/Tencor Surfscan)]]
  ⚫
*[[Photoluminescence PL Setup (Custom)]]
 
*[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]]
  
*[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]]
 
**''Surface hydrophobicity''
  
**''Surface hydrophobicity''
⚫
|-
  
⚫
|
  
⚫
|
  
 
|-
  
|-
 
|}
  
|}

Revision as of 22:52, 1 October 2022

Lithography

Photoresists and Lithography Chemicals
Contact Aligners (Optical Exposure)
Direct-Write Lithography
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography
Lithography Support

Vacuum Deposition

Physical Vapor Deposition (PVD)

Thermal Evaporation
Sputter Deposition
Chemical Vapor Deposition (CVD)

Dry Etch

Reactive Ion Etching (RIE)
Plasma Etching and Cleaning
Etch Monitoring
ICP-RIE
Ion Milling and Reactive Ion Beam Etching
Other Dry Etching

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Die Singulation / Down-sizing

Other Packaging

Wafer/Die Bonding

Inspection, Test and Characterization

Optical Microscopy
Electron Microscopy
Topographical Metrology
Thin-Film/Material Analysis
Thickness + Optical Constants
Electrical Analysis
Other Properties
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