Difference between revisions of "Tool List"

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(→‎Thermal Processing: link to RTP Solaris 150)
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__NOTOC__
 
__NOTOC__
 
=Lithography=
 
=Lithography=
You can see our available photoresists on the [https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemical_Datasheets Chemical Datasheets page].
+
 
 
{|
 
{|
 
|- valign="top"
 
|- valign="top"
 
| width="300" |
 
| width="300" |
===== Contact Aligners (Optical Exposure) =====
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=====Photoresists and Lithography Chemicals=====
* [[Suss Aligners (SUSS MJB-3)]]
+
 
* [[IR Aligner (SUSS MJB-3 IR)]]
+
*See the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Chemical Datasheets page].
* [[Contact Aligner (SUSS MA-6)]]
+
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
* [[DUV Flood Expose]]
+
 
 +
=====Contact Aligners (Optical Exposure)=====
 +
 
 +
*[[Suss Aligners (SUSS MJB-3)]]
 +
*[[IR Aligner (SUSS MJB-3 IR)]]
 +
*[[Contact Aligner (SUSS MA-6)]]
 +
*[[DUV Flood Expose]]
 +
 
 +
=====Direct-Write Lithography=====
 +
 
 +
*[[E-Beam Lithography System (JEOL JBX-6300FS)]]
 +
*[[Field Emission SEM 1 (FEI Sirion)|E-Beam Lithography (FEI Sirion Nabity v9)]]
 +
*[[Focused Ion-Beam Lithography (Raith Velion)]]
 +
*[[Maskless Aligner (Heidelberg MLA150)]]
  
 
===== Other Patterning Systems =====
 
===== Other Patterning Systems =====
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
+
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
* [[Nano-Imprint (Nanonex NX2000)]]
 
* [[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
 
 
| width="400" |
 
| width="400" |
===== Steppers (Optical Exposure) =====
+
=====Steppers (Optical Exposure)=====
* [[Stepper 1 (GCA 6300)|Stepper 1 (GCA 6300, i-line)]]
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* [[Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200, i-line)]]
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*[[Stepper 1 (GCA 6300)|Stepper 1 (GCA 6300, i-line)]]
* [[Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV, Deep-UV)]]
+
*[[Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200, i-line)]]
 +
*[[Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV, Deep-UV)]]
  
===== Thermal Processing for Photolithography =====
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=====Thermal Processing for Photolithography=====
* [[Ovens 1, 2 & 3 (Labline)]]
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* [[Oven 4 (Fisher)]]
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*[[Ovens - Overview of All Lab Ovens|Ovens - Overview of all lab ovens]]
* [[Oven 5 (Labline)]]
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*[[Ovens 1, 2 & 3 (Labline)]]
* [[High Temp Oven (Blue M)]]
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*[[Oven 4 (Fisher)]]
* [[Vacuum Oven (YES)]]
+
*[[Oven 5 (Labline)]]
* The [https://www.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
+
*[[High Temp Oven (Blue M)]]
 +
*[[Vacuum Oven (YES)]]
 +
 
 +
=====Lithography Support=====
 +
 
 +
*The [https://wiki.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
 +
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 POLOS spinners] on Develop and Solvent benches
 +
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]]
 
|-
 
|-
 
|}
 
|}
  
= Vacuum Deposition =
+
=Vacuum Deposition=
  
 
{|
 
{|
 
|- valign="top"
 
|- valign="top"
 
| width="300" |
 
| width="300" |
===== Physical Vapor Deposition (PVD) =====
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=====Physical Vapor Deposition (PVD)=====
*[[E-Beam 1 (Sharon)]]  
+
 
*[[E-Beam 2 (Custom)]]  
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*[[E-Beam 1 (Sharon)]]
*[[E-Beam 3 (Temescal)]]  
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*[[E-Beam 2 (Custom)]]
*[[E-Beam 4 (CHA)]]  
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*[[E-Beam 3 (Temescal)]]
*[[Thermal Evap 1]]  
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*[[E-Beam 4 (CHA)]]
*[[Thermal Evap 2 (Solder)]]  
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*[[Thermal Evap 1]]
 +
*[[Thermal Evap 2 (Solder)]]
  
===== Sputter Deposition =====
+
=====Sputter Deposition=====
*[[Sputter 3 (AJA ATC 2000-F)]]  
+
 
*[[Sputter 4 (AJA ATC 2200-V)]]  
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*[[Sputter 3 (AJA ATC 2000-F)]]
 +
*[[Sputter 4 (AJA ATC 2200-V)]]
 
*[[Sputter 5 (AJA ATC 2200-V)]]
 
*[[Sputter 5 (AJA ATC 2200-V)]]
 
*[[Ion Beam Deposition (Veeco NEXUS)]]
 
*[[Ion Beam Deposition (Veeco NEXUS)]]
  
 
| width="400" |
 
| width="400" |
===== Chemical Vapor Deposition (CVD) =====
+
=====Chemical Vapor Deposition (CVD)=====
*[[PECVD 1 (PlasmaTherm 790)]]  
+
 
*[[PECVD 2 (Advanced Vacuum)]]  
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*[[PECVD 1 (PlasmaTherm 790)]]
*[[ICP-PECVD (Unaxis VLR)]]  
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*[[PECVD 2 (Advanced Vacuum)]]
*[[Molecular Vapor Deposition]]  
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*[[ICP-PECVD (Unaxis VLR)]]
 +
*[[Molecular Vapor Deposition]]
 
*[[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposition (Oxford FlexAL)]]
 
*[[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposition (Oxford FlexAL)]]
  
 
|}
 
|}
  
= Dry Etch =
+
=Dry Etch=
  
 
{|
 
{|
 
|- valign="top"
 
|- valign="top"
 
| width="300" |
 
| width="300" |
===== Reactive Ion Etching (RIE) =====
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=====Reactive Ion Etching (RIE)=====
*[[RIE 2 (MRC)]]  
+
 
*[[RIE 3 (MRC)]]  
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*[[RIE 2 (MRC)]]
*[[RIE 5 (PlasmaTherm)]]  
+
*[[RIE 3 (MRC)]]
*[[Ashers (Technics PEII)]]  
+
*[[RIE 5 (PlasmaTherm)]]
*[[Plasma Clean (Gasonics 2000)]]  
+
 
*[[Plasma Activation (EVG 810)]]  
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=====Plasma Etching and Cleaning=====
*[[CAIBE (Oxford Ion Mill)]]  
+
 
 +
*[[Plasma Clean (Gasonics 2000)]]
 +
*[[Plasma Clean (YES EcoClean)]]
 +
*[[Plasma Activation (EVG 810)]]
 +
*[[Ashers (Technics PEII)]]
 +
 
 +
=====Etch Monitoring=====
  
===== Etch Monitoring =====
+
*[[Laser Etch Monitoring]] (Endpoint Detection)
* [[Laser Etch Monitoring]] (Endpoint Detection)
+
*Optical Emission Spectra
* Optical Emission Spectra
+
*Residual Gas Analyzer (RGA)
* Residual Gas Analyzer (RGA)
 
 
| width="400" |
 
| width="400" |
===== ICP-RIE =====
+
=====ICP-RIE=====
*[[ICP Etch 1 (Panasonic E626I)]]  
+
 
*[[ICP Etch 2 (Panasonic E640)]]  
+
*[[ICP Etch 1 (Panasonic E626I)]]
 +
*[[ICP Etch 2 (Panasonic E640)]]
 
*[[ICP-Etch (Unaxis VLR)]]
 
*[[ICP-Etch (Unaxis VLR)]]
 
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]]
 
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]]
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]]  
+
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]]
 +
 
 +
=====Ion Milling and Reactive Ion Beam Etching=====
 +
 
 +
*[[CAIBE (Oxford Ion Mill)]]
 +
 
 +
=====Other Dry Etching=====
  
===== Other Dry Etching =====
+
*[[UV Ozone Reactor]]
*[[UV Ozone Reactor]]  
+
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]  
 
 
*[[Vapor HF Etch]]
 
*[[Vapor HF Etch]]
  
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|- valign="top"
 
|- valign="top"
 
| width="300" |
 
| width="300" |
* [[Wet Benches]]
+
*[[Wet Benches]]
 
**[[Solvent Cleaning Benches]]
 
**[[Solvent Cleaning Benches]]
 
**[[Spin Coat Benches]]
 
**[[Spin Coat Benches]]
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**[[Plating Bench]]
 
**[[Plating Bench]]
 
| width="400" |
 
| width="400" |
* [[Gold Plating Bench]]
+
*[[Gold Plating Bench]]
* [[Critical Point Dryer]]
+
*[[Critical Point Dryer]]
* [[Spin Rinse Dryer (SemiTool)]]
+
*[[Spin Rinse Dryer (SemiTool)]]
* [[Chemical-Mechanical Polisher (Logitech)]]
+
*[[Chemical-Mechanical Polisher (Logitech)]]
 +
*[[Mechanical Polisher (Allied)]]
 +
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
 +
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 Auto. Wet-Processing Spinners (POLOS)]
 
|-
 
|-
 
|}
 
|}
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|- valign="top"
 
|- valign="top"
 
| width="400" |
 
| width="400" |
* [[Rapid Thermal Processor (AET RX6)|Rapid Thermal Annealer/Processor "RTA" (AET RX6)]]
+
*[[Rapid Thermal Processor (AET RX6)|Rapid Thermal Annealer/Processor "RTA" (AET RX6)]]
* [[Rapid Thermal Processor (SSI Solaris 150)]]
+
*[[Rapid Thermal Processor (SSI Solaris 150)]]
* [[Strip Annealer]]
+
*[[Tube Furnace (Tystar 8300)]]
* [[High Temp Oven (Blue M)]]
+
*[[Tube Furnace Wafer Bonding (Thermco)]]
* [[Tube Furnace (Tystar 8300)]]
+
*[[Tube Furnace AlGaAs Oxidation (Lindberg)]]
* [[Tube Furnace Wafer Bonding (Thermco)]]
+
*[[Wafer Bonder (SUSS SB6-8E)]]
* [[Tube Furnace AlGaAs Oxidation (Linberg)]]
+
*[[Wafer Bonder (Logitech WBS7)|Wafer Bonder/Wax Mounting (Logitech WBS2)]]
 
| width="400" |
 
| width="400" |
* [[Ovens 1, 2 & 3 (Labline)]]
+
*[[Ovens - Overview of All Lab Ovens|Ovens - Overview of all Lab Ovens]]
* [[Oven 4 (Fisher)]]
+
**[[Ovens 1, 2 & 3 (Labline)]]
* [[Oven 5 (Labline)]]
+
**[[Oven 4 (Thermo-Fisher HeraTherm)]]
* [[Vacuum Oven (YES)]]
+
**[[Oven 5 (Labline)]]
* [[Wafer Bonder (SUSS SB6-8E)]]
+
**[[Vacuum Oven (YES)]]
* [[Wafer Bonder (Logitech WBS7)|Wafer Bonder/Wax Mounting (Logitech WBS2)]]
+
**[[High Temp Oven (Blue M)]]
 +
|
 
|-
 
|-
 
|}
 
|}
  
 
=Packaging=
 
=Packaging=
* [[Dicing Saw (ADT)]]
+
 
* [[Flip-Chip Bonder (Finetech)]]
+
*[[Dicing Saw (ADT)]]
* [[Vacuum Sealer]]
+
*[[Flip-Chip Bonder (Finetech)]]
* [[Wire Saw (Takatori)]]
+
*[[Vacuum Sealer]]
 +
*[[Wire Saw (Takatori)]]
  
 
=Inspection, Test and Characterization=
 
=Inspection, Test and Characterization=
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|- valign="top"
 
|- valign="top"
 
| width="300" |
 
| width="300" |
===== Optical/Electron Microscopy =====
+
=====Optical Microscopy=====
* [[Field Emission SEM 1 (FEI Sirion)]]
 
* [[Field Emission SEM 2 (JEOL 7600F)]]
 
* [[SEM Sample Coater (Hummer)]]
 
* [[Microscopes|Optical Microscopes]]
 
* [[Fluorescence Microscope (Olympus MX51)]]
 
* [[Deep UV Optical Microscope (Olympus)]]
 
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
 
* [[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]]
 
  
===== Topographical Metrology =====
+
*[[Microscopes|Optical Microscopes]]
* [[Step Profilometer (KLA Tencor P-7)]]
+
*[[Fluorescence Microscope (Olympus MX51)]]
* [[Step Profilometer (Dektak 6M)]]
+
*[[Deep UV Optical Microscope (Olympus)]]
* [[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
+
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
* [[Surface Analysis (KLA/Tencor Surfscan)]]
+
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]]
** ''Sub-micron Particle Counter''
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*[[Digital Microscope (Olympus DSX1000)|Digital Microscope #7 (Olympus DSX1000)]]
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
+
 
* [[Optical Profilometer - White-Light/Phase-Shift Interference (Filmetrics Profilm3D)]]
+
===== Electron Microscopy =====
 +
*[[Field Emission SEM 1 (FEI Sirion)]]
 +
*[[Field Emission SEM 2 (JEOL 7600F)]]
 +
*[[SEM Sample Coater (Hummer)]]
 +
 
 +
=====Topographical Metrology=====
 +
 
 +
*[[Step Profilometer (KLA Tencor P-7)]]
 +
*[[Step Profilometer (Dektak 6M)]]
 +
*[[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
 +
*[[Surface Analysis (KLA/Tencor Surfscan)]]
 +
**''Sub-micron Particle Counter''
 +
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
 
| width="400" |
 
| width="400" |
===== Thin-Film Analysis/Measurement =====
+
=====Thin-Film/Material Analysis=====
* [[Ellipsometer (Woollam)]]  
+
 
* [[Film Stress (Tencor Flexus)]]  
+
====== Thickness + Optical Constants ======
* [[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]]
+
*[[Ellipsometer (Woollam)]]
* [[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
+
*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
* [[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
+
*[[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]]
* [[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
+
*[[Optical Film Thickness (Nanometric)]]
* [[Optical Film Thickness (Nanometric)]]
+
*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
* [[Resistivity Mapper (CDE RESMAP)]]
+
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
  
===== Other Tools =====
+
====== Other Properties ======
* [[Probe Station & Curve Tracer]]
+
*[[Film Stress (Tencor Flexus)]]
* [[Goniometer]]
+
*[[Photoluminescence PL Setup (Custom)]]
* [[Photoluminescence PL Setup (Custom)]]
+
 
 +
====== Electrical Analysis ======
 +
*[[Resistivity Mapper (CDE RESMAP)]]
 +
*[[Probe Station & Curve Tracer]]
 +
 
 +
=====Other Tools=====
 +
 
 +
*[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]]
 +
**''Surface hydrophobicity''
 +
|-
 +
|
 +
|
 
|-
 
|-
 
|}
 
|}

Revision as of 11:38, 11 May 2021

Lithography

Photoresists and Lithography Chemicals
Contact Aligners (Optical Exposure)
Direct-Write Lithography
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography
Lithography Support

Vacuum Deposition

Physical Vapor Deposition (PVD)
Sputter Deposition
Chemical Vapor Deposition (CVD)

Dry Etch

Reactive Ion Etching (RIE)
Plasma Etching and Cleaning
Etch Monitoring
ICP-RIE
Ion Milling and Reactive Ion Beam Etching
Other Dry Etching

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Inspection, Test and Characterization

Optical Microscopy
Electron Microscopy
Topographical Metrology
Thin-Film/Material Analysis
Thickness + Optical Constants
Other Properties
Electrical Analysis
Other Tools