Difference between revisions of "Tool List"

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__NOTOC__
  
__NOTOC__
 
=Lithography=
  
=Lithography=
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{|
  
{|
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|-valign="top"
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|- valign="top"
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|width=300|
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| width="300" |
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=====Photoresists and Lithography Chemicals=====
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* [[Suss Aligners (SUSS MJB-3)]]
  
  +
−
* [[IR Aligner (SUSS MJB-3 IR)]]
  
  +
*See the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Chemical Datasheets page].
−
* [[DUV Flood Expose]]
  
  +
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
−
* [[Ovens 1, 2 & 3 (Labline)]]
  
  +
−
* [[Oven 4 (Fisher)]]
  
  +
=====Contact Aligners (Optical Exposure)=====
−
* [[Oven 5 (Blue M)]]
  
  +
−
* [[Vacuum Oven (YES)]]
  
−
* [[Holographic Lith/PL Setup]]
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*[[Suss Aligners (SUSS MJB-3)]]
  +
*[[IR Aligner (SUSS MJB-3 IR)]]
−
|width=400|
  
−
* [[Stepper 1 (GCA 6300)]]
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*[[Contact Aligner (SUSS MA-6)]]
−
* [[Stepper 2 (AutoStep 200)]]
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*[[DUV Flood Expose]]
  +
−
* [[Stepper 3 (ASML)]]
  
−
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
 +
=====Direct-Write Lithography=====
  +
−
* [[AFM-based Nanolithography Tool (NanoMan)]]
  
  +
*[[E-Beam Lithography System (JEOL JBX-6300FS)]]
−
* [[Nano-Imprint Tool (Nanonex NX2000)]]
  
  +
*[[Field Emission SEM 1 (FEI Sirion)|E-Beam Lithography (FEI Sirion Nabity v9)]]
−
* [[Contact Aligner (SUSS MA-6)]]
  
−
* [[Wafer Bonder (SUSS SB6-8E)]]
 +
*[[Focused Ion-Beam Lithography (Raith Velion)]]
  +
*[[Maskless Aligner (Heidelberg MLA150)]]
  +
  +
===== Other Patterning Systems =====
  +
*[[Nano-Imprint (Nanonex NX2000)]]
  +
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
  +
| width="400" |
  +
=====Steppers (Optical Exposure)=====
  +
  +
*[[Stepper 1 (GCA 6300)|Stepper 1 (GCA 6300, i-line)]]
  +
*[[Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200, i-line)]]
  +
*[[Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV, Deep-UV)]]
  +
  +
=====Thermal Processing for Photolithography=====
  +
  +
*[[Ovens - Overview of All Lab Ovens|Ovens - Overview of all lab ovens]]
  +
*[[Ovens 1, 2 & 3 (Labline)]]
  +
*[[Oven 4 (Fisher)]]
  +
*[[Oven 5 (Labline)]]
  +
*[[High Temp Oven (Blue M)]]
  +
*[[Vacuum Oven (YES)]]
  +
  +
=====Lithography Support=====
  +
  +
*The [https://wiki.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
  +
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 POLOS spinners] on Develop and Solvent benches
  +
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]]
 
|-
  
|-
 
|}
  
|}
   
 
=Vacuum Deposition=
  
=Vacuum Deposition=
  +
 
{|
  
{|
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|-valign="top"
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|- valign="top"
−
|width=300|
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| width="300" |
  +
=====Physical Vapor Deposition (PVD)=====
−
* [[E-Beam 1 (Sharon)]]
  
  +
−
* [[E-Beam 2 (Custom)]]
  
−
* [[E-Beam 3 (Temescal)]]
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*[[E-Beam 1 (Sharon)]]
−
* [[E-Beam 4 (CHA)]]
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*[[E-Beam 2 (Custom)]]
−
* [[Sputter 1 (Custom)]]
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*[[E-Beam 3 (Temescal)]]
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* [[Sputter 2 (SFI Endeavor)]]
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*[[E-Beam 4 (CHA)]]
−
* [[Sputter 3 (AJA)]]
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*[[Thermal Evap 1]]
−
* [[Sputter 4 (AJA)]]
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*[[Thermal Evap 2 (Solder)]]
  +
−
* [[Sputter 5 (Lesker AXXIS)]]
  
  +
=====Sputter Deposition=====
−
|width=400|
  
  +
−
* [[PECVD 1 (PlasmaTherm 790)]]
  
−
* [[PECVD 2 (Advanced Vacuum)]]
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*[[Sputter 3 (AJA ATC 2000-F)]]
−
* [[Thermal Evap 1]]
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*[[Sputter 4 (AJA ATC 2200-V)]]
−
* [[Thermal Evap 2]]
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*[[Sputter 5 (AJA ATC 2200-V)]]
  +
*[[Ion Beam Deposition (Veeco NEXUS)]]
−
* [[Unaxis VLR ICP-PECVD]]
  
  +
−
* [[Ion Beam Deposition (Veeco NEXUS)]]
  
  +
| width="400" |
−
* [[Molecular Vapor Deposition]]
  
  +
=====Chemical Vapor Deposition (CVD)=====
−
* [[Atomic Layer Deposision (Oxford FlexAL)]]
  
  +
−
|-
  
  +
*[[PECVD 1 (PlasmaTherm 790)]]
  +
*[[PECVD 2 (Advanced Vacuum)]]
  +
*[[ICP-PECVD (Unaxis VLR)]]
  +
*[[Molecular Vapor Deposition]]
  +
*[[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposition (Oxford FlexAL)]]
  +
 
|}
  
|}
   
−
= Dry Etch =
 +
=Dry Etch=
   
 
{|
  
{|
 
|- valign="top"
  
|- valign="top"
−
| width="300" |
+
| width="300" |
  +
=====Reactive Ion Etching (RIE)=====
−
*[[RIE 1 (Custom)]]
 
−
*[[RIE 2 (MRC)]]
 
−
*[[RIE 3 (MRC)]]
 
−
*[[RIE 5 (PlasmaTherm SLR)]]
 
−
*[[Si Deep RIE (Bosch Etch)]]
 
−
*[[Ashers (Technics PEII)]]
 
−
*[[Unaxis VLR ICP-Etch]]
  
   
  +
*[[RIE 2 (MRC)]]
−
| width="400" |
 
−
*[[ICP Etch 1 (Panasonic E620)]]
+
*[[RIE 3 (MRC)]]
−
*[[ICP Etch 2 (Panasonic E626)]]
+
*[[RIE 5 (PlasmaTherm)]]
  +
−
*[[UV Ozone Reactor]]
 
  +
=====Plasma Etching and Cleaning=====
−
*[[Plasma Clean (Gasonics 2000)]]
 
  +
−
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
 
−
*[[Plasma Activation Tool (EVG 810)]]
+
*[[Plasma Clean (Gasonics 2000)]]
−
*[[HF Vapor Etch]]
 +
*[[Plasma Clean (YES EcoClean)]]
  +
*[[Plasma Activation (EVG 810)]]
  +
*[[Ashers (Technics PEII)]]
  +
  +
=====Etch Monitoring=====
  +
  +
*[[Laser Etch Monitoring]] (Endpoint Detection)
  +
*Optical Emission Spectra
  +
*Residual Gas Analyzer (RGA)
  +
| width="400" |
  +
=====ICP-RIE=====
  +
  +
*[[ICP Etch 1 (Panasonic E626I)]]
  +
*[[ICP Etch 2 (Panasonic E640)]]
  +
*[[ICP-Etch (Unaxis VLR)]]
  +
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]]
  +
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]]
  +
  +
=====Ion Milling and Reactive Ion Beam Etching=====
  +
  +
*[[CAIBE (Oxford Ion Mill)]]
  +
  +
=====Other Dry Etching=====
  +
  +
*[[UV Ozone Reactor]]
  +
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
  +
*[[Vapor HF Etch]]
   
 
|}
  
|}
   
 
=Wet Processing=
  
=Wet Processing=
  +
See the [[Chemical List|Chemical List page]] for stocked chemicals such as Developers, Etchants, Solvents etc.
 
{|
  
{|
−
|-valign="top"
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|- valign="top"
−
|width=300|
 +
| width="300" |
−
* [[Gold Plating Bench]]
 +
*[[Wet Benches]]
−
* [[Critical Point Dryer]]
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**[[Solvent Cleaning Benches]]
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* [[Spin Rinse Dryer (SemiTool)]]
 +
**[[Spin Coat Benches]]
−
* [[Scales]]
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**[[Develop Benches]]
−
** [[Wet Etch Wafer Scale]]
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**[[Toxic Corrosive Benches]]
−
** [[Solvent Processing Wafer Scale]]
 +
**[[HF/TMAH Processing Benches]]
  +
**[[Plating Bench]]
−
|width=400|
  
  +
| width="400" |
−
* [[Chemical-Mechanical Polisher (Logitech)]]
  
−
* [[Wet Benches]]
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*[[Gold Plating Bench]]
−
**[[Photoresist Spin Benches]]
 +
*[[Critical Point Dryer]]
  +
*[[Spin Rinse Dryer (SemiTool)]]
−
**[[Lithography Development & Solvent Clean Benches]]
  
  +
*[[Chemical-Mechanical Polisher (Logitech)]]
−
**[[Wet Etch Benches]]
  
  +
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
  +
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 Auto. Wet-Processing Spinners (POLOS)]
 
|-
  
|-
 
|}
  
|}
   
 
=Thermal Processing=
  
=Thermal Processing=
  +
{|
−
* [[Rapid Thermal Processor (AET RX6)]]
  
  +
|- valign="top"
−
* [[Strip Annealer]]
  
  +
| width="400" |
−
* [[Tube Furnace (Tystar 8300)]]
  
  +
*[[Rapid Thermal Processor (AET RX6)|Rapid Thermal Annealer/Processor "RTA" (AET RX6)]]
−
* [[Tube Furnace Wafer Bonding (Thermco)]]
  
  +
*[[Rapid Thermal Processor (SSI Solaris 150)]]
−
* [[Tube Furnace AlGaAs Oxidation (Linberg)]]
  
  +
*[[Tube Furnace (Tystar 8300)]]
  +
*[[Tube Furnace Wafer Bonding (Thermco)]]
  +
*[[Tube Furnace AlGaAs Oxidation (Lindberg)]]
  +
*[[Wafer Bonder (SUSS SB6-8E)]]
  +
*[[Wafer Bonder (Logitech WBS7)|Wafer Bonder/Wax Mounting (Logitech WBS2)]]
  +
| width="400" |
  +
*[[Ovens - Overview of All Lab Ovens|Ovens - Overview of all Lab Ovens]]
  +
**[[Ovens 1, 2 & 3 (Labline)]]
  +
**[[Oven 4 (Thermo-Fisher HeraTherm)]]
  +
**[[Oven 5 (Labline)]]
  +
**[[Vacuum Oven (YES)]]
  +
**[[High Temp Oven (Blue M)]]
  +
|
  +
|-
  +
|}
   
 
=Packaging=
  
=Packaging=
  +
−
* [[Flip-Chip Bonder (Finetech)]]
  
−
* [[Vacuum Sealer]]
 +
*[[Dicing Saw (ADT)]]
−
* [[Dicing Saw (ADT)]]
 +
*[[Flip-Chip Bonder (Finetech)]]
−
* [[Wire Saw (Takatori)]]
 +
*[[Vacuum Sealer]]
  +
*[[Wire Saw (Takatori)]]
   
 
=Inspection, Test and Characterization=
  
=Inspection, Test and Characterization=
 
{|
  
{|
−
|-valign="top"
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|- valign="top"
−
|width=300|
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| width="300" |
  +
=====Optical Microscopy=====
−
* [[Field Emission SEM 1 (FEI Sirion)]]
  
  +
−
* [[Field Emission SEM 2 (JEOL 7600F)]]
  
  +
*[[Microscopes|Optical Microscopes]]
−
* [[Step Profile (Dektak IIA)]]
  
−
* [[Step Profilometer (Dektak 6M)]]
 +
*[[Fluorescence Microscope (Olympus MX51)]]
  +
*[[Deep UV Optical Microscope (Olympus)]]
−
* [[Ellipsometer (Rudolph)]]
  
  +
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
−
* [[Microscopes]]
  
  +
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]]
−
* [[Probe Station & Curve Tracer]]
  
  +
−
* [[Optical Film Thickness (Filmetrics)]]
  
  +
===== Electron Microscopy =====
−
* [[Optical Film Thickness (Nanometric)]]
  
−
* [[Scanning Probe Microscope (Veeco NanoMan)]]
 +
*[[Field Emission SEM 1 (FEI Sirion)]]
  +
*[[Field Emission SEM 2 (JEOL 7600F)]]
−
|width=400|
  
−
* [[Tencor Flexus Film Stress]]
 +
*[[SEM Sample Coater (Hummer)]]
  +
−
* [[SEM Sample Coater (Hummer)]]
  
  +
=====Topographical Metrology=====
−
* [[Surface Analysis (KLA/Tencor Surfscan)]]
  
  +
−
* [[Photo-emission & IR Microscope (QFI)]]
  
  +
*[[Step Profilometer (KLA Tencor P-7)]]
−
* [[Ellipsometer (Woollam)]]
  
  +
*[[Step Profilometer (Dektak 6M)]]
−
* [[Goniometer]]
  
  +
*[[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
−
* [[4-Point Probe Resistivity Mapper]]
  
  +
*[[Surface Analysis (KLA/Tencor Surfscan)]]
−
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
  
  +
**''Sub-micron Particle Counter''
−
* [[Deep UV Optical Microscope (Olympus)]]
  
  +
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
  +
| width="400" |
  +
=====Thin-Film/Material Analysis=====
  +
  +
====== Thickness + Optical Constants ======
  +
*[[Ellipsometer (Woollam)]]
  +
*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
  +
*[[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]]
  +
*[[Optical Film Thickness (Nanometric)]]
  +
*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
  +
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
  +
  +
====== Other Properties ======
  +
*[[Film Stress (Tencor Flexus)]]
  +
*[[Photoluminescence PL Setup (Custom)]]
  +
  +
====== Electrical Analysis ======
  +
*[[Resistivity Mapper (CDE RESMAP)]]
  +
*[[Probe Station & Curve Tracer]]
  +
  +
=====Other Tools=====
  +
  +
*[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]]
  +
**''Surface hydrophobicity''
  +
|-
  +
|
  +
|
 
|-
  
|-
 
|}
  
|}

Revision as of 23:14, 26 January 2021

Lithography

Photoresists and Lithography Chemicals
Contact Aligners (Optical Exposure)
Direct-Write Lithography
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography
Lithography Support

Vacuum Deposition

Physical Vapor Deposition (PVD)
Sputter Deposition
Chemical Vapor Deposition (CVD)

Dry Etch

Reactive Ion Etching (RIE)
Plasma Etching and Cleaning
Etch Monitoring
ICP-RIE
Ion Milling and Reactive Ion Beam Etching
Other Dry Etching

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Inspection, Test and Characterization

Optical Microscopy
Electron Microscopy
Topographical Metrology
Thin-Film/Material Analysis
Thickness + Optical Constants
Other Properties
Electrical Analysis
Other Tools
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Tool_List&oldid=158716"