Difference between revisions of "Tool List"
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(→Inspection, Test and Characterization: reorganized optical tools) |
(→Lithography: added "direct write" section) |
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*[[DUV Flood Expose]] |
*[[DUV Flood Expose]] |
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− | ===== |
+ | =====Direct-Write Lithography===== |
*[[E-Beam Lithography System (JEOL JBX-6300FS)]] |
*[[E-Beam Lithography System (JEOL JBX-6300FS)]] |
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+ | *[[Field Emission SEM 1 (FEI Sirion)|E-Beam Lithography (FEI Sirion Nabity v9)]] |
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+ | *[[Focused Ion-Beam Lithography (Raith Velion)]] |
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+ | *[[Maskless Aligner (Heidelberg MLA150)]] |
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+ | |||
+ | ===== Other Patterning Systems ===== |
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*[[Nano-Imprint (Nanonex NX2000)]] |
*[[Nano-Imprint (Nanonex NX2000)]] |
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*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]] |
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]] |
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|- valign="top" |
|- valign="top" |
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| width="300" | |
| width="300" | |
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− | =====Optical |
+ | =====Optical Microscopy===== |
*[[Microscopes|Optical Microscopes]] |
*[[Microscopes|Optical Microscopes]] |
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*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
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*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]] |
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]] |
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+ | |||
+ | ===== Electron Microscopy ===== |
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*[[Field Emission SEM 1 (FEI Sirion)]] |
*[[Field Emission SEM 1 (FEI Sirion)]] |
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*[[Field Emission SEM 2 (JEOL 7600F)]] |
*[[Field Emission SEM 2 (JEOL 7600F)]] |
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*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
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| width="400" | |
| width="400" | |
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− | ===== |
+ | =====Thin-Film/Material Analysis===== |
====== Thickness + Optical Constants ====== |
====== Thickness + Optical Constants ====== |
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*[[Photoluminescence PL Setup (Custom)]] |
*[[Photoluminescence PL Setup (Custom)]] |
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− | ====== Electrical |
+ | ====== Electrical Analysis ====== |
*[[Resistivity Mapper (CDE RESMAP)]] |
*[[Resistivity Mapper (CDE RESMAP)]] |
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*[[Probe Station & Curve Tracer]] |
*[[Probe Station & Curve Tracer]] |
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=====Other Tools===== |
=====Other Tools===== |
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− | *[[Goniometer]] |
+ | *[[Goniometer (Rame-Hart A-100)|Goniometer (Ramé-Hart A-100)]] |
**''Surface hydrophobicity'' |
**''Surface hydrophobicity'' |
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+ | |- |
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+ | | |
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+ | | |
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Revision as of 10:26, 5 November 2020
Lithography
Photoresists and Lithography ChemicalsContact Aligners (Optical Exposure)Direct-Write Lithography
Other Patterning Systems |
Steppers (Optical Exposure)Thermal Processing for Photolithography
Lithography Support
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Vacuum Deposition
Physical Vapor Deposition (PVD)
Sputter Deposition |
Chemical Vapor Deposition (CVD) |
Dry Etch
Reactive Ion Etching (RIE)Plasma Etching and Cleaning
Etch Monitoring
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ICP-RIE
Ion Milling and Reactive Ion Beam EtchingOther Dry Etching |
Wet Processing
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.
Thermal Processing
Packaging
Inspection, Test and Characterization
Optical Microscopy
Electron MicroscopyTopographical Metrology |
Thin-Film/Material AnalysisThickness + Optical Constants
Other PropertiesElectrical AnalysisOther Tools
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