Difference between revisions of "Tool List"
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(→Inspection, Test and Characterization: reorganized optical tools) (Tag: Visual edit) |
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*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
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| width="400" | |
| width="400" | |
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− | ===== |
+ | =====Optical Material Analysis===== |
+ | ====== Thickness + Optical Constants ====== |
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*[[Ellipsometer (Woollam)]] |
*[[Ellipsometer (Woollam)]] |
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− | *[[Film Stress (Tencor Flexus)]] |
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− | *[[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]] |
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*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]] |
*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]] |
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+ | *[[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]] |
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+ | *[[Optical Film Thickness (Nanometric)]] |
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*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]] |
*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]] |
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*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]] |
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]] |
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+ | |||
− | *[[Optical Film Thickness (Nanometric)]] |
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+ | ====== Other Properties ====== |
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+ | *[[Film Stress (Tencor Flexus)]] |
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+ | *[[Photoluminescence PL Setup (Custom)]] |
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+ | |||
+ | ====== Electrical Device/Thin-Film Analysis ====== |
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*[[Resistivity Mapper (CDE RESMAP)]] |
*[[Resistivity Mapper (CDE RESMAP)]] |
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+ | *[[Probe Station & Curve Tracer]] |
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=====Other Tools===== |
=====Other Tools===== |
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− | *[[Probe Station & Curve Tracer]] |
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*[[Goniometer]] |
*[[Goniometer]] |
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+ | **''Surface hydrophobicity'' |
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− | *[[Photoluminescence PL Setup (Custom)]] |
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Revision as of 14:21, 12 May 2020
Lithography
Photoresists and Lithography ChemicalsContact Aligners (Optical Exposure)Other Patterning Systems |
Steppers (Optical Exposure)Thermal Processing for Photolithography
Lithography Support
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Vacuum Deposition
Physical Vapor Deposition (PVD)
Sputter Deposition |
Chemical Vapor Deposition (CVD) |
Dry Etch
Reactive Ion Etching (RIE)Plasma Etching and Cleaning
Etch Monitoring
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ICP-RIE
Ion Milling and Reactive Ion Beam EtchingOther Dry Etching |
Wet Processing
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.
Thermal Processing
Packaging
Inspection, Test and Characterization
Optical/Electron Microscopy
Topographical Metrology |
Optical Material AnalysisThickness + Optical Constants
Other PropertiesElectrical Device/Thin-Film AnalysisOther Tools
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