Difference between revisions of "Tool List"
m (→Thermal Processing: corrected linberg --> lindberg over) (Tag: Visual edit) |
m (→Optical/Electron Microscopy: moved SEMs to bottom) (Tag: Visual edit) |
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===== Optical/Electron Microscopy ===== |
===== Optical/Electron Microscopy ===== |
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− | * [[Field Emission SEM 1 (FEI Sirion)]] |
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− | * [[Field Emission SEM 2 (JEOL 7600F)]] |
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− | * [[SEM Sample Coater (Hummer)]] |
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* [[Microscopes|Optical Microscopes]] |
* [[Microscopes|Optical Microscopes]] |
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* [[Fluorescence Microscope (Olympus MX51)]] |
* [[Fluorescence Microscope (Olympus MX51)]] |
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* [[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
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* [[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]] |
* [[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]] |
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+ | * [[Field Emission SEM 1 (FEI Sirion)]] |
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+ | * [[Field Emission SEM 2 (JEOL 7600F)]] |
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+ | * [[SEM Sample Coater (Hummer)]] |
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===== Topographical Metrology ===== |
===== Topographical Metrology ===== |
Revision as of 13:01, 30 May 2019
Lithography
You can see our available photoresists on the Chemical Datasheets page.
Contact Aligners (Optical Exposure)Other Patterning Systems |
Steppers (Optical Exposure)Thermal Processing for Photolithography
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Vacuum Deposition
Physical Vapor Deposition (PVD)
Sputter Deposition |
Chemical Vapor Deposition (CVD) |
Dry Etch
Reactive Ion Etching (RIE)
Etch Monitoring
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ICP-RIE
Other Dry Etching |
Wet Processing
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.