Difference between revisions of "Tool List"

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(Topographical Metrology: removed Rudolph Ellips & old Dektak)
(Dry Etch: link to etch monitors, specifically Laser Etch Monitoring page)
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*[[Plasma Activation (EVG 810)]]
*[[Plasma Activation (EVG 810)]]
*[[CAIBE (Oxford Ion Mill)]]
*[[CAIBE (Oxford Ion Mill)]]
===== Etch Monitoring =====
* [[Laser Etch Monitoring]] (Endpoint Detection)
* Optical Emission Spectra
* Residual Gas Analyzer (RGA)
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| width="400" |
===== ICP-RIE =====
===== ICP-RIE =====

Revision as of 11:17, 9 November 2018


You can see our available photoresists on the Chemical Datasheets page.

Contact Aligners (Optical Exposure)
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography

Vacuum Deposition

Physical Vapor Deposition (PVD)
Sputter Deposition
Chemical Vapor Deposition (CVD)

Dry Etch

Reactive Ion Etching (RIE)
Etch Monitoring
Other Dry Etching

Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing


Inspection, Test and Characterization

Optical/Electron Microscopy
Topographical Metrology
Thin-Film Analysis/Measurement
Other Tools