Difference between revisions of "Tool List"
(→Topographical Metrology: link to new KLA profiler) (Tag: Visual edit) |
(→Topographical Metrology: removed Rudolph Ellips & old Dektak) (Tag: Visual edit) |
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===== Topographical Metrology ===== |
===== Topographical Metrology ===== |
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− | * [[Step Profile (Dektak IIA)]] |
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− | * [[Step Profilometer (Dektak 6M)]] |
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* [[Step Profilometer (KLA Tencor P-7)]] |
* [[Step Profilometer (KLA Tencor P-7)]] |
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+ | * [[Step Profilometer (Dektak 6M)]] |
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* [[Atomic Force Microsope (Dimension 3100/Nanoscope IVA)]] |
* [[Atomic Force Microsope (Dimension 3100/Nanoscope IVA)]] |
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* [[Surface Analysis (KLA/Tencor Surfscan)]] |
* [[Surface Analysis (KLA/Tencor Surfscan)]] |
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===== Thin-Film Analysis/Measurement ===== |
===== Thin-Film Analysis/Measurement ===== |
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* [[Ellipsometer (Woollam)]] |
* [[Ellipsometer (Woollam)]] |
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− | * [[Ellipsometer (Rudolph)]] |
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* [[Film Stress (Tencor Flexus)]] |
* [[Film Stress (Tencor Flexus)]] |
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* [[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]] |
* [[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]] |
Revision as of 22:16, 10 October 2018
Lithography
You can see our available photoresists on the Chemical Datasheets page.
Contact Aligners (Optical Exposure)Other Patterning Systems |
Steppers (Optical Exposure)Thermal Processing for Photolithography
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Vacuum Deposition
Physical Vapor Deposition (PVD)
Sputter Deposition |
Chemical Vapor Deposition (CVD) |
Dry Etch
Reactive Ion Etching (RIE) |
ICP-RIE
Other Dry Etching |
Wet Processing
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.