Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)"
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(moved SEM images to table, changed "File:" link --> Direct link to file) |
(add one SEM pic) |
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|0.74 |
|0.74 |
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|77.9 |
|77.9 |
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| + | |[https://www.nanotech.ucsb.edu/wiki/index.php/File:SiO2_Etch_using_ICP2_with_O2.pdf] |
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|1/28/2019 |
|1/28/2019 |
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