Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4-ICP1"

Revision as of 09:10, 23 April 2020

ICP#1: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec
Date	Sample#	Etch Rate (nm/min)	Etch Selectivity (SiO2/PR)	Averaged Sidewall Angle (^o)	SEM Images
1/28/2019	I11901	110	1.35	see SEM →	[1]
5/29/2019	I11903	105	1.41		[2]
1/13/2020	I12001	78.0	1.06	unusual - two regions	[3]
Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020. Data below for 1/23 shows rate returned to "normal".
1/23/2020	I12002	109	1.16		[4]
2/28/2020	I12003	119	1.17	56.6	[5]
Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested. Data below shows etch returned to "normal".
3/3/2020	I12004	110	1.05		[6]

@@ Line 14: / Line 14: @@
 |110
 |1.35
+|see SEM →
-|
 |[https://wiki.nanotech.ucsb.edu/wiki/images/b/b1/I11901.pdf]
 |-
@@ Line 28: / Line 28: @@
 |78.0
 |1.06
+|unusual - two regions
-|
 |[https://wiki.nanotech.ucsb.edu/wiki/images/b/bb/I1200107.pdf]
 |-
-| colspan="6" |Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020.  Data below for 1/23 shows rate returned to "normal".
+| colspan="6" |''Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020.  Data below for 1/23 shows rate returned to "normal".''
 |-
 |1/23/2020
@@ Line 47: / Line 47: @@
 |[https://wiki.nanotech.ucsb.edu/wiki/images/e/ec/I1200301.pdf]
 |-
-| colspan="6" |Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested.
+| colspan="6" |''Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested. Data below shows etch returned to "normal".''
 |-
 |3/3/2020