Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4-ICP1"

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m (added selectivity to recent ICP1 cals)
(added etch data for 7/27)
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|'''SEM Images'''
  
|'''SEM Images'''
 
|-
  
|-
−
|1/28/2019
 +
|7/27/2022
  +
|ND_Pan1_072722
⚫
|I11901
  
  ⚫
|134.6
⚫
|110
  
−
|1.35
 +
|1.12
  ⚫
|
⚫
|see SEM →
  
−
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b1/I11901.pdf]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/3/35/CS_004.jpg <nowiki>[CS]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/79/30D_001.jpg <nowiki>[30D]</nowiki>]
 
|-
  
|-
−
|5/29/2019
 +
|5/10/2022
  +
|NP_ICP1_07
⚫
|I11903
  
−
|105
 +
|146
−
|1.41
 +
|1.34
 
|
  
|
−
|[https://wiki.nanotech.ucsb.edu/wiki/images/c/c6/I11903.pdf]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/a/a4/ICP1_07_45D_008.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a7/ICP1_07_CS_006.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
−
|1/13/2020
 +
|4/26/2022
  +
|NP_ICP1_06
⚫
|I12001
  
−
|78.0
 +
|139.4
−
|1.06
 +
|1.36
  ⚫
|
⚫
|unusual - two regions
  
−
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/bb/I1200107.pdf]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/5/56/ICP1_06_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/4/49/ICP1_06_CS_002.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
  +
|4/20/2022
⚫
| colspan="6" |''Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020. Data below for 1/23 shows rate returned to "normal".''
  
  +
|NP_ICP1_05
  +
|140
  ⚫
|1.13
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/w/images/7/74/ICP1_05_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/72/ICP1_05_CS_002.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
−
|1/23/2020
 +
|4/13/2022
  +
|NP_ICP1_04
⚫
|I12002
  
  +
|140.3
⚫
|109
  
−
|1.16
 +
|1.24
 
|
  
|
−
|[https://wiki.nanotech.ucsb.edu/wiki/images/d/d4/I1200211.pdf]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/9/98/ICP1_004_45D_004.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/4/45/ICP1_004_CS_001.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
−
|2/28/2020
 +
|3/29/2022
  ⚫
|NP_ICP1_03
⚫
|I12003
  
  ⚫
|136.9
⚫
|119
  
−
|1.17
 +
|1.19
⚫
|56.6
  
⚫
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/ec/I1200301.pdf]
  
⚫
|-
  
⚫
| colspan="6" |''Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested. Data below shows etch returned to "normal".''
  
⚫
|-
  
⚫
|3/3/2020
  
⚫
|I12004
  
⚫
|110
  
⚫
|1.05
  
 
|
  
|
−
|[https://wiki.nanotech.ucsb.edu/w/images/b/b3/I1200415.pdf]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/a/ac/ICP1_03_45D_002.jpg <nowiki>[1]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/e/e8/ICP1_03_CS_005.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
−
|1/7/2021
 +
|3/8/2022
  ⚫
|NP_ICP1_02
⚫
|I12101
  
  ⚫
|133.7
⚫
|118
  
 
|1.12
  
|1.12
 
|
  
|
−
|[https://wiki.nanotech.ucsb.edu/w/images/4/49/I1210113.pdf]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/1/14/ICP1_02_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a0/ICP1_02_CS_002.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
 
|3/2/2022
  
|3/2/2022
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|[https://wiki.nanotech.ucsb.edu/w/images/4/44/ICP1_01_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/8/87/ICP1_01_CS_003.jpg <nowiki>[2]</nowiki>]
  
|[https://wiki.nanotech.ucsb.edu/w/images/4/44/ICP1_01_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/8/87/ICP1_01_CS_003.jpg <nowiki>[2]</nowiki>]
 
|-
  
|-
−
|3/8/2022
 +
|1/7/2021
  ⚫
|I12101
⚫
|NP_ICP1_02
  
  ⚫
|118
⚫
|133.7
  
 
|1.12
  
|1.12
 
|
  
|
−
|[https://wiki.nanotech.ucsb.edu/w/images/1/14/ICP1_02_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a0/ICP1_02_CS_002.jpg <nowiki>[2]</nowiki>]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/4/49/I1210113.pdf]
 
|-
  
|-
−
|3/29/2022
 +
|3/3/2020
  ⚫
|I12004
⚫
|NP_ICP1_03
  
  ⚫
|110
⚫
|136.9
  
−
|1.19
 +
|1.05
 
|
  
|
−
|[https://wiki.nanotech.ucsb.edu/w/images/a/ac/ICP1_03_45D_002.jpg <nowiki>[1]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/e/e8/ICP1_03_CS_005.jpg <nowiki>[2]</nowiki>]
 +
|[https://wiki.nanotech.ucsb.edu/w/images/b/b3/I1200415.pdf]
  +
|-
  ⚫
| colspan="6" |''Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested. Data for 3/3 shows etch returned to "normal".''
  +
|-
  ⚫
|2/28/2020
  ⚫
|I12003
  ⚫
|119
  +
|1.17
  +
|56.6
  ⚫
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/ec/I1200301.pdf]
  +
|-
  +
|1/23/2020
  ⚫
|I12002
  ⚫
|109
  +
|1.16
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/d/d4/I1200211.pdf]
  +
|-
  ⚫
| colspan="6" |''Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020. Data below for 1/23 shows rate returned to "normal".''
  +
|-
  +
|1/13/2020
  ⚫
|I12001
  +
|78.0
  +
|1.06
  ⚫
|unusual - two regions
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/bb/I1200107.pdf]
  +
|-
  +
|5/29/2019
  ⚫
|I11903
  +
|105
  +
|1.41
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/c/c6/I11903.pdf]
  +
|-
  +
|1/28/2019
  ⚫
|I11901
  ⚫
|110
  +
|1.35
  ⚫
|see SEM →
  +
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b1/I11901.pdf]
 
|}
  
|}
   

Revision as of 18:11, 29 July 2022

ICP#1 Recipe: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec
Date Sample# Etch Rate (nm/min) Etch Selectivity (SiO2/PR) Averaged Sidewall Angle (o) SEM Images
7/27/2022 ND_Pan1_072722 134.6 1.12 [CS] [30D]
5/10/2022 NP_ICP1_07 146 1.34 [1] [2]
4/26/2022 NP_ICP1_06 139.4 1.36 [1] [2]
4/20/2022 NP_ICP1_05 140 1.13 [1] [2]
4/13/2022 NP_ICP1_04 140.3 1.24 [1] [2]
3/29/2022 NP_ICP1_03 136.9 1.19 [1][2]
3/8/2022 NP_ICP1_02 133.7 1.12 [1] [2]
3/2/2022 NP_ICP1_01 141.4 1.20 [1] [2]
1/7/2021 I12101 118 1.12 [1]
3/3/2020 I12004 110 1.05 [2]
Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested. Data for 3/3 shows etch returned to "normal".
2/28/2020 I12003 119 1.17 56.6 [3]
1/23/2020 I12002 109 1.16 [4]
Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020. Data below for 1/23 shows rate returned to "normal".
1/13/2020 I12001 78.0 1.06 unusual - two regions [5]
5/29/2019 I11903 105 1.41 [6]
1/28/2019 I11901 110 1.35 see SEM → [7]


OLD Etch Test Data

Alternate SiO2 etch recipe with O2 included.

ICP#1: 0.5Pa, 50/500W, CHF3/CF4/O2=35/5/10sccm, time=210 sec
Date Sample# Etch Rate (nm/min) Etch Selectivity (SiO2/PR) Averaged Sidewall Angle (o) SEM Images
1/28/2019 I11902 78.1 0.63 [8]
5/29/2019 I11904 71.1 0.58 [9]
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