Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4-ICP1"
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+ | |+'''ICP#1 Recipe:''' |
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− | | colspan="5" |ICP#1: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec |
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+ | 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec |
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+ | |- |
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+ | |'''Date''' |
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+ | |'''Sample#''' |
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+ | |'''Etch Rate (nm/min)''' |
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+ | |'''Etch Selectivity (SiO2/PR)''' |
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+ | |'''Averaged Sidewall Angle (<sup>o</sup>)''' |
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+ | |'''SEM Images''' |
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+ | |- |
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+ | |7/27/2022 |
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+ | |ND_Pan1_072722 |
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+ | |134.6 |
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+ | |1.12 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/3/35/CS_004.jpg <nowiki>[CS]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/79/30D_001.jpg <nowiki>[30D]</nowiki>] |
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+ | |- |
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+ | |5/10/2022 |
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+ | |NP_ICP1_07 |
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+ | |146 |
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+ | |1.34 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/a/a4/ICP1_07_45D_008.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a7/ICP1_07_CS_006.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |4/26/2022 |
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+ | |NP_ICP1_06 |
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+ | |139.4 |
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+ | |1.36 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/5/56/ICP1_06_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/4/49/ICP1_06_CS_002.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |4/20/2022 |
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+ | |NP_ICP1_05 |
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+ | |140 |
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+ | |1.13 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/7/74/ICP1_05_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/72/ICP1_05_CS_002.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |4/13/2022 |
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+ | |NP_ICP1_04 |
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+ | |140.3 |
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+ | |1.24 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/9/98/ICP1_004_45D_004.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/4/45/ICP1_004_CS_001.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |3/29/2022 |
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+ | |NP_ICP1_03 |
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+ | |136.9 |
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+ | |1.19 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/a/ac/ICP1_03_45D_002.jpg <nowiki>[1]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/e/e8/ICP1_03_CS_005.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |3/8/2022 |
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+ | |NP_ICP1_02 |
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+ | |133.7 |
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+ | |1.12 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/1/14/ICP1_02_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a0/ICP1_02_CS_002.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |3/2/2022 |
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+ | |NP_ICP1_01 |
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+ | |141.4 |
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+ | |1.20 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/4/44/ICP1_01_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/8/87/ICP1_01_CS_003.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |1/7/2021 |
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+ | |I12101 |
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+ | |118 |
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+ | |1.12 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/4/49/I1210113.pdf] |
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+ | |- |
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+ | |3/3/2020 |
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+ | |I12004 |
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+ | |110 |
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+ | |1.05 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/b/b3/I1200415.pdf] |
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+ | |- |
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+ | | colspan="6" |''Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested. Data for 3/3 shows etch returned to "normal".'' |
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+ | |- |
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+ | |2/28/2020 |
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+ | |I12003 |
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+ | |119 |
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+ | |1.17 |
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+ | |56.6 |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/e/ec/I1200301.pdf] |
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+ | |- |
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+ | |1/23/2020 |
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+ | |I12002 |
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+ | |109 |
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+ | |1.16 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/d/d4/I1200211.pdf] |
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+ | |- |
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+ | | colspan="6" |''Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020. Data below for 1/23 shows rate returned to "normal".'' |
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+ | |- |
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+ | |1/13/2020 |
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+ | |I12001 |
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+ | |78.0 |
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+ | |1.06 |
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+ | |unusual - two regions |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/b/bb/I1200107.pdf] |
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+ | |- |
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+ | |5/29/2019 |
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+ | |I11903 |
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+ | |105 |
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+ | |1.41 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/c/c6/I11903.pdf] |
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+ | |- |
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+ | |1/28/2019 |
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+ | |I11901 |
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+ | |110 |
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+ | |1.35 |
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+ | |see SEM → |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/b/b1/I11901.pdf] |
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+ | |} |
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+ | |||
+ | |||
+ | ===OLD Etch Test Data=== |
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+ | Alternate SiO<sub>2</sub> etch recipe with O2 included. |
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+ | |||
+ | {| class="wikitable" |
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+ | | colspan="5" |ICP#1: 0.5Pa, 50/500W, CHF3/CF4/O2=35/5/10sccm, time=210 sec |
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|1/28/2019 |
|1/28/2019 |
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+ | |I11902 |
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− | |I11901 |
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+ | |78.1 |
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− | |110 |
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− | | |
+ | |0.63 |
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− | |[https:// |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/3/33/I11902.pdf] |
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|5/29/2019 |
|5/29/2019 |
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+ | |I11904 |
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− | |I11903 |
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+ | |71.1 |
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− | |105 |
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− | | |
+ | |0.58 |
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| |
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− | |[https:// |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/b/bc/I11904.pdf] |
− | |- |
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− | |1/13/2020 |
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− | |I12001 |
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− | |78.0 |
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− | |1.06 |
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− | | |
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− | |[https://wiki.nanotech.ucsb.edu/wiki/images/b/bb/I1200107.pdf] |
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|} |
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Revision as of 18:11, 29 July 2022
Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (SiO2/PR) | Averaged Sidewall Angle (o) | SEM Images |
7/27/2022 | ND_Pan1_072722 | 134.6 | 1.12 | [CS] [30D] | |
5/10/2022 | NP_ICP1_07 | 146 | 1.34 | [1] [2] | |
4/26/2022 | NP_ICP1_06 | 139.4 | 1.36 | [1] [2] | |
4/20/2022 | NP_ICP1_05 | 140 | 1.13 | [1] [2] | |
4/13/2022 | NP_ICP1_04 | 140.3 | 1.24 | [1] [2] | |
3/29/2022 | NP_ICP1_03 | 136.9 | 1.19 | [1][2] | |
3/8/2022 | NP_ICP1_02 | 133.7 | 1.12 | [1] [2] | |
3/2/2022 | NP_ICP1_01 | 141.4 | 1.20 | [1] [2] | |
1/7/2021 | I12101 | 118 | 1.12 | [1] | |
3/3/2020 | I12004 | 110 | 1.05 | [2] | |
Sidewall profile on 2/28/2020 etches is slanted, chamber will be wet-cleaned on 3/2/2020 and re-tested. Data for 3/3 shows etch returned to "normal". | |||||
2/28/2020 | I12003 | 119 | 1.17 | 56.6 | [3] |
1/23/2020 | I12002 | 109 | 1.16 | [4] | |
Rate on 1/13/2020 is low by ~20%, so chamber was wet-cleaned on 1/21/2020. Data below for 1/23 shows rate returned to "normal". | |||||
1/13/2020 | I12001 | 78.0 | 1.06 | unusual - two regions | [5] |
5/29/2019 | I11903 | 105 | 1.41 | [6] | |
1/28/2019 | I11901 | 110 | 1.35 | see SEM → | [7] |
OLD Etch Test Data
Alternate SiO2 etch recipe with O2 included.
ICP#1: 0.5Pa, 50/500W, CHF3/CF4/O2=35/5/10sccm, time=210 sec | |||||
Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (SiO2/PR) | Averaged Sidewall Angle (o) | SEM Images |
1/28/2019 | I11902 | 78.1 | 0.63 | [8] | |
5/29/2019 | I11904 | 71.1 | 0.58 | [9] |