Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4"
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m (added selectivity to ICP2 cals) |
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|Etch Rate (nm/min) |
|Etch Rate (nm/min) |
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|Etch Selectivity (SiO2/PR) |
|Etch Selectivity (SiO2/PR) |
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+ | |Comments |
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− | |Averaged Sidewall Angle (<sup>o</sup>) |
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|SEM Images |
|SEM Images |
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− | | |
+ | |5/5/2022 |
+ | |NP_ICP2_07 |
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⚫ | |||
− | | |
+ | |170 |
− | |1. |
+ | |1.11 |
+ | |Right after Quartz Top-Plate Temperature reduced 100°C-->50°C. Etch Characteristics look similar to before. |
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⚫ | |||
− | |[https://wiki.nanotech.ucsb.edu/wiki/images/1/ |
+ | |[https://wiki.nanotech.ucsb.edu/w/images/9/94/ICP2_07_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/1/10/ICP2_07_CS_005.jpg <nowiki>[2]</nowiki>] |
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|- |
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− | | |
+ | |4/26/2022 |
+ | |NP_ICP2_06 |
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⚫ | |||
+ | |176.3 |
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− | |146 |
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− | |1. |
+ | |1.14 |
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| |
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− | |[https://wiki.nanotech.ucsb.edu/wiki/images/f/ |
+ | |[https://wiki.nanotech.ucsb.edu/w/images/e/ec/ICP2_06_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/f/f6/ICP2_06_CS_001.jpg <nowiki>[2]</nowiki>] |
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|- |
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− | | |
+ | |4/20/2022 |
+ | |NP_ICP2_05 |
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⚫ | |||
+ | |171.7 |
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− | |151 |
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+ | |1.13 |
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⚫ | |||
+ | |[https://wiki.nanotech.ucsb.edu/w/images/9/9c/ICP2_05_45D_003.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a5/ICP2_05_CS_001.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |4/12/2022 |
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+ | |NP_ICP2_04 |
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+ | |167.9 |
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+ | |1.17 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/6/6b/ICP2_004_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/4/49/ICP2_004_CS_003.jpg <nowiki>[2]</nowiki>] |
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+ | |- |
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+ | |3/30/2022 |
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+ | |NP_ICP2_03 |
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+ | |164 |
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|1.23 |
|1.23 |
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+ | | |
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⚫ | |||
− | |[https://wiki.nanotech.ucsb.edu/wiki/images/ |
+ | |[https://wiki.nanotech.ucsb.edu/w/images/c/c3/ICP2_03_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/74/ICP2_03_CS_003.jpg <nowiki>[2]</nowiki>] |
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|- |
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− | | |
+ | |3/8/2022 |
+ | |NP_ICP2_02 |
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⚫ | |||
− | | |
+ | |144 |
− | |1. |
+ | |1.02 |
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| |
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− | |[https://wiki.nanotech.ucsb.edu/wiki/images/ |
+ | |[https://wiki.nanotech.ucsb.edu/w/images/f/f4/ICP2_02_45D_001.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/5/54/ICP2_02_CS_004.jpg <nowiki>[2]</nowiki>] |
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|- |
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− | | |
+ | |3/2/2022 |
+ | |NP_ICP2_01 |
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⚫ | |||
+ | |169.6 |
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− | |149 |
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− | |1. |
+ | |1.29 |
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| |
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− | |[https://wiki.nanotech.ucsb.edu/wiki/images/ |
+ | |[https://wiki.nanotech.ucsb.edu/w/images/2/2e/ICP2_01_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/6/69/ICP2_01_CS_007.jpg <nowiki>[2]</nowiki>] |
+ | |- |
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+ | |8/9/2021 |
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⚫ | |||
+ | |140 |
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+ | |0.97 |
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⚫ | |||
+ | |[https://wiki.nanotech.ucsb.edu/w/images/2/26/I2210508.pdf] |
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+ | |- |
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+ | |8/9/2021 |
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+ | |I22104 |
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+ | |147 |
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+ | |1.06 |
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+ | |Before etching diamond sample for 1 hour using Cl2/Ar |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/2/28/I2210411.pdf] |
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+ | |- |
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+ | |7/21/2021 |
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⚫ | |||
+ | |134 |
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+ | |1.09 |
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⚫ | |||
+ | |[https://wiki.nanotech.ucsb.edu/w/images/c/c3/I2210308.pdf] |
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+ | |- |
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+ | |5/19/2021 |
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⚫ | |||
+ | |163 |
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+ | |1.11 |
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⚫ | |||
+ | |[https://wiki.nanotech.ucsb.edu/w/images/4/4c/I2210214.pdf] |
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+ | |- |
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+ | |1/7/2021 |
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⚫ | |||
+ | |144 |
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+ | |1.20 |
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+ | | |
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+ | |[https://wiki.nanotech.ucsb.edu/w/images/0/0c/I2210102.pdf] |
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|- |
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|8/9/2020 |
|8/9/2020 |
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|[https://wiki.nanotech.ucsb.edu/w/images/d/d4/I2200203.pdf] |
|[https://wiki.nanotech.ucsb.edu/w/images/d/d4/I2200203.pdf] |
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|- |
|- |
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− | |1/ |
+ | |1/16/2020 |
⚫ | |||
⚫ | |||
− | | |
+ | |149 |
− | |1. |
+ | |1.21 |
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| |
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− | |[https://wiki.nanotech.ucsb.edu/ |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/0/09/I2200122.pdf] |
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|- |
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− | | |
+ | |7/18/2019 |
⚫ | |||
⚫ | |||
− | | |
+ | |162 |
− | |1. |
+ | |1.37 |
+ | | |
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⚫ | |||
− | |[https://wiki.nanotech.ucsb.edu/ |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/2/23/I2190506.pdf] |
|- |
|- |
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− | | |
+ | |3/6/2019 |
⚫ | |||
⚫ | |||
− | | |
+ | |151 |
− | |1. |
+ | |1.23 |
⚫ | |||
⚫ | |||
− | |[https://wiki.nanotech.ucsb.edu/ |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/8/87/SiO2_Etch_using_ICP2_no_O2-3-06-2019.pdf] |
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|- |
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− | | |
+ | |1/28/2019 |
⚫ | |||
⚫ | |||
− | | |
+ | |146 |
− | | |
+ | |1.23 |
⚫ | |||
| |
| |
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+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/f/f9/SiO2_Etch_using_ICP2-no_O2-a.pdf] |
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⚫ | |||
+ | |- |
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+ | |10/5/2018 |
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⚫ | |||
+ | |160 |
||
+ | |1.2 |
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⚫ | |||
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/1/13/SiO2_Etch_using_ICP2-no_O2.pdf] |
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+ | |}<br /> |
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+ | ===Alternate Data (not updated)=== |
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+ | ''We stopped taking data for the following table in 2019, use the above data instead.'' |
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+ | |||
+ | *[[Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)|Test Data of etching SiO2 with CHF3/CF4/O2]] |
Revision as of 10:36, 11 May 2022
ICP#2: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec | |||||
Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (SiO2/PR) | Comments | SEM Images |
5/5/2022 | NP_ICP2_07 | 170 | 1.11 | Right after Quartz Top-Plate Temperature reduced 100°C-->50°C. Etch Characteristics look similar to before. | [1] [2] |
4/26/2022 | NP_ICP2_06 | 176.3 | 1.14 | [1] [2] | |
4/20/2022 | NP_ICP2_05 | 171.7 | 1.13 | [1] [2] | |
4/12/2022 | NP_ICP2_04 | 167.9 | 1.17 | [1] [2] | |
3/30/2022 | NP_ICP2_03 | 164 | 1.23 | [1] [2] | |
3/8/2022 | NP_ICP2_02 | 144 | 1.02 | [1] [2] | |
3/2/2022 | NP_ICP2_01 | 169.6 | 1.29 | [1] [2] | |
8/9/2021 | I22105 | 140 | 0.97 | After etching diamond sample for 1 hour using Cl2/Ar. Found chamber/etches are ok. | [1] |
8/9/2021 | I22104 | 147 | 1.06 | Before etching diamond sample for 1 hour using Cl2/Ar | [2] |
7/21/2021 | I22103 | 134 | 1.09 | Investigating reports of low etch rate | [3] |
5/19/2021 | I22102 | 163 | 1.11 | Etch time=130 sec | [4] |
1/7/2021 | I22101 | 144 | 1.20 | [5] | |
8/9/2020 | I22002 | 102 | 0.86 | caused by air leaking to CHF3 channel | [6] |
1/16/2020 | I22001 | 149 | 1.21 | [7] | |
7/18/2019 | I21905 | 162 | 1.37 | [8] | |
3/6/2019 | I21904 | 151 | 1.23 | 85.6 | [9] |
1/28/2019 | I21901 | 146 | 1.23 | [10] | |
10/5/2018 | SiO2#02 | 160 | 1.2 | 82.1 | [11] |
Alternate Data (not updated)
We stopped taking data for the following table in 2019, use the above data instead.