Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4"
Jump to navigation
Jump to search
(Text replacement - "www.nanotech.ucsb.edu/wiki/" to "wiki.nanotech.ucsb.edu/wiki/") |
|||
(26 intermediate revisions by 2 users not shown) | |||
Line 1: | Line 1: | ||
{| class="wikitable" |
{| class="wikitable" |
||
| colspan="5" |ICP#2: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec |
| colspan="5" |ICP#2: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec |
||
+ | | |
||
|- |
|- |
||
|Date |
|Date |
||
Line 7: | Line 8: | ||
|Etch Selectivity (SiO2/PR) |
|Etch Selectivity (SiO2/PR) |
||
|Averaged Sidewall Angle (<sup>o</sup>) |
|Averaged Sidewall Angle (<sup>o</sup>) |
||
+ | |SEM Images |
||
|- |
|- |
||
|10/5/2018 |
|10/5/2018 |
||
Line 13: | Line 15: | ||
|1.2 |
|1.2 |
||
|82.1 |
|82.1 |
||
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/1/13/SiO2_Etch_using_ICP2-no_O2.pdf] |
||
+ | |- |
||
+ | |1/28/2019 |
||
+ | |I21901 |
||
+ | |146 |
||
+ | |1.23 |
||
+ | | |
||
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/f/f9/SiO2_Etch_using_ICP2-no_O2-a.pdf] |
||
+ | |- |
||
+ | |3/6/2019 |
||
+ | |I21904 |
||
+ | |151 |
||
+ | |1.23 |
||
+ | |85.6 |
||
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/8/87/SiO2_Etch_using_ICP2_no_O2-3-06-2019.pdf] |
||
+ | |- |
||
+ | |7/18/2019 |
||
+ | |I21905 |
||
+ | |162 |
||
+ | |1.37 |
||
+ | | |
||
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/2/23/I2190506.pdf] |
||
+ | |- |
||
+ | |1/16/2020 |
||
+ | |I22001 |
||
+ | |149 |
||
+ | |1.21 |
||
+ | | |
||
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/0/09/I2200122.pdf] |
||
|} |
|} |
||
− | [[:File:SiO2 Etch using ICP2-no O2.pdf]] |
Revision as of 18:29, 6 April 2020
ICP#2: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec | |||||
Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (SiO2/PR) | Averaged Sidewall Angle (o) | SEM Images |
10/5/2018 | SiO2#02 | 160 | 1.2 | 82.1 | [1] |
1/28/2019 | I21901 | 146 | 1.23 | [2] | |
3/6/2019 | I21904 | 151 | 1.23 | 85.6 | [3] |
7/18/2019 | I21905 | 162 | 1.37 | [4] | |
1/16/2020 | I22001 | 149 | 1.21 | [5] |