Difference between revisions of "Template:News"
| Line 15: | Line 15: | ||
The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. |
The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. |
||
| − | [[User:John d|-- |
+ | [[User:John d|-- ]] 22:16, 27 November 2017 (PST) |
| Line 27: | Line 27: | ||
The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. |
The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. |
||
| − | 12:00, 01 July 2015 (PST) |
+ | [[User:Thibeault|-- ]] 12:00, 01 July 2015 (PST) |
Revision as of 11:00, 28 November 2017
News from the U.C. Santa Barbara Nanofabrication Facility.
New Deep Silicon Etcher Online
The new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer.
-- 22:16, 27 November 2017 (PST)
2016 Survey Results
See the May 2016 User Survey Results.
-- Brian Thibeault 12:00, 01 May 2016 (PST)
CAIBE Ion Mill Available
The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information.
-- 12:00, 01 July 2015 (PST)
NanoFiles SFTP Online
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details.
-- Brian Thibeault 12:00, 07 July 2013 (PST)