Difference between revisions of "Template:News"

Latest revision as of 22:06, 16 November 2023

News from the U.C. Santa Barbara Nanofabrication Facility.

NanoFab staff awarded Goleta's Innovator of the Year 2023

NanoFab staff member Demis D. John has been awarded the City of Goleta's "Innovator of the Year" for 2023! The award stems from the UCSB Nanofab's impact on the communities of Santa Barbara County and surrounding regions, in enabling cutting edge technology companies to thrive, which also enables many local careers in advanced high-tech. See the full announcement by the Santa Barbara South Coast Chamber of Commerce. //John d 13:58, 7 November 2023 (PST)

NanoFab Featured in Regional Tech Videos

The UCSB NanoFab is showcased as a driver of innovation and enabler of the regional high-tech industry.

See the videos here:

Santa Barbara County: This is TechTopia	UCSB NanoFab: An Innovation Center

// John d 09:26, 1 November 2023 (PST)

CHIPS Act Award Announced to USC and UCSB NanoFab

U.S. Congressman Salud Carbajal congratulates UCSB and the NanoFab on receiving a CHIPS & Science Act award, as part of the California DREAMS Hub (Microelectronics Commons) led by USC. // Demis 12:06, 4 October 2023 (PDT)

JEOL SEM's Installed

Both SEM's have been replaced with new JEOL SEM's #1 and SEM #2. SEM#1 has the NABITY lithography system installed, and SEM #2 has always-on EDAX elemental analysis. Contact the supervisor, Aidan Hopkins, for more information. // John d 18:31, 20 September 2023 (PDT)

Wide FOV Microscope Installed

We have installed an AmScope stereo microscope in Bay 4 for wide field-of-view digital imaging/capture, with >2cm of FOV currently available. Wiki page here: AmScope Wide Field of View Stereoscope // John d 14:52, 19 April 2023 (PDT)

Loomis Scribe & Break installed

We have installed a new Loomis LSD-155LT Automated Scribe & Break Cleaving tool in the Back-End Processing lab. Qualifications are underway. Contact supervisor, Aidan Hopkins, for more information. // John d 09:41, 16 April 2023 (PDT)

Dektak XT installed

We have replaced the old Dektak 6M with a new Dektak XT profilometer. This tool will provide robust, fast metrology for rapid in-process topography inspection. // John d 10:41, 25 January 2023 (PST)

New Process Control data tables

We have added "Process Control Data" - data on deposition/etch repeatability - to a number of our highest used etchers and deposition tools. The datasheets are linked in multiple places, mainly on the Recipes pages for each tool, or on the general Recipes pages for Deposition Recipes or Etch Recipes. // John d 16:07, 5 January 2023 (PST)

See older articles at this link

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+=== NanoFab staff awarded Goleta's Innovator of the Year 2023 ===
+NanoFab staff member [[Demis D. John]] has been awarded the ''City of Goleta's "Innovator of the Year"'' for 2023! The award stems from the UCSB Nanofab's impact on the communities of Santa Barbara County and surrounding regions, in enabling cutting edge technology companies to thrive, which also enables many local careers in advanced high-tech.  See the [https://sbscchamber.com/goletas-finest-2023-award-recipients-announced/ full announcement by the Santa Barbara South Coast Chamber of Commerce]. //[[User:John d|John d]] 13:58, 7 November 2023 (PST)
-=== TechTalk: Dr. Garett Cole & Dr. Songtao Liu ===
+=== NanoFab Featured in Regional Tech Videos ===
+The UCSB NanoFab is showcased as a driver of innovation and enabler of the regional high-tech industry.
-[https://www.nanotech.ucsb.edu/wiki/index.php/Tech_Talks_Seminar_Series#Thursday.2C_Sept._5.2C_12pm.2C_ESB1001.2C_Light_Lunch_Provided Tech Talks on Wed Sept 4th, in ESB room 1001 (click for more info)]:
+See the videos here:
-n: Dr. Garrett Cole, Crystalline Mirror Solutions: “Semiconductor Supermirrors”
+{| class="wikitable"
+|[https://fast.wistia.net/embed/iframe/l46hsnwg4b?controlsVisibleOnLoad=true&muted=0&playerColor&copyLinkAndThumbnailEnabled=false '''''Santa Barbara County: This is TechTopia'''''] [[File:Techtopia_Vid_-_Thumbnail_PlayButton.jpg|none|300x300px|link=https://fast.wistia.net/embed/iframe/l46hsnwg4b?controlsVisibleOnLoad=true&muted=0&playerColor&copyLinkAndThumbnailEnabled=false]]
+|[https://www.youtube.com/watch?v=op746os6eRI '''''UCSB NanoFab: An Innovation Center'''''] [[File:NanoFab_COE_Engineering_Vid_-_thumbnail_2_crop.jpg|none|300x300px|link=https://www.youtube.com/watch?v=op746os6eRI]]
-pm: Songtao Liu, “High Performance Lasers on Silicon”
+|}
+// [[User:John d|John d]] 09:26, 1 November 2023 (PST)
-=== New Plasma Asher Installation ===
-A new [https://www.yieldengineering.com/Products/Plasma-Strip-Descum-Systems/YES-ÉcoClean ''YES EcoClean Plasma Strip/Descum System''] is being installed, for controlled photoresist etching & residue stripping.  We will make an announcement when the system has been qualified and is ready for use.
-// [[User:John d|John d]] 11:03, 7 August 2019 (PDT)
+=== CHIPS Act Award Announced to USC and UCSB NanoFab ===
-=== Rapid Thermal Annealer Installed ===
+[https://carbajal.house.gov/news/documentsingle.aspx?DocumentID=1672 U.S. Congressman Salud Carbajal congratulates UCSB and the NanoFab] on receiving a [https://www.nist.gov/chips CHIPS & Science Act] award, as part of the [https://microelectronicscommons.org/ California DREAMS Hub (Microelectronics Commons) led by USC].
-We are installing and qualifying a new [http://ssi-rtp.com/page/products/rtp-solaris-150/ SSI ''Solaris 150 Rapid Thermal Processor''].  We will make an announcement when the system is ready and trainings are scheduled.  See the [[Rapid Thermal Processor (SSI Solaris 150)|SSI RTP Wiki Page here]].
-// [[User:John d|John d]] 12:03, 28 May 2019 (PDT)
+// [[User:John d|Demis]] 12:06, 4 October 2023 (PDT)
+=== JEOL SEM's Installed ===
-=== S-Cubed Spin/Coat/Dev Station Installation ===
+Both SEM's have been replaced with new JEOL [[SEM_1_(JEOL_IT800SHL)|SEM's #1]] and [[Field_Emission_SEM_2_(JEOL_IT800SHL)|SEM #2]]. SEM#1 has the NABITY lithography system installed, and SEM #2 has always-on EDAX elemental analysis. Contact the [[Aidan_Hopkins|supervisor, Aidan Hopkins]], for more information.
-We are currently in the process of installing a Cube system for automated Spin Coating, Baking, Developing and Edge-Bead Removal on 4-inch and 6-inch wafers.  Initially this tool will be solely purposed for Staff and the use of the sponsor, primarily for [[Stepper 3 (ASML DUV)|ASML DUV Stepper]] wafer prep. As procedures are developed, the system will be opened up for use by all ASML Stepper users, and may eventually be opened for I-Line stepper use as well.
-// [[User:John d|John d]] 12:10, 20 February 2019 (PST)
+// [[User:John d|John d]] 18:31, 20 September 2023 (PDT)
-=== Filmetrics Optical Profilometer ===
+=== Wide FOV Microscope Installed ===
+We have installed an AmScope stereo microscope in Bay 4 for wide field-of-view digital imaging/capture, with >2cm of FOV currently available.  Wiki page here: [[Microscopes#Microscope_.238:_AmScope_Wide_Field_of_View_Stereoscope_.28Bay_4.29|AmScope Wide Field of View Stereoscope]]
-A new [https://www.filmetrics.com/profilometers/profilm3d Filmetrics Profilm3D] optical profilometer is being qualified. The system complements the [[Laser_Scanning_Confocal_M-scope_(Olympus_LEXT)|LEXT Confocal Microscope]] and [[Atomic Force Microscope (Bruker ICON)|AFM]], by providing large-area profiles (~5-10mm square) with nanometer-level height resolution, and possibly a fast surface roughness measurement.  See the [[White-Light/Phase-Shift_Interference_Profilometer_(Filmetrics_Profilm3D)|Profilm3D Wiki Page]] for more info on the capabilities and techniques.
-// [[User:John d|John d]] 10:59, 14 December 2018 (PST)
+// [[User:John d|John d]] 14:52, 19 April 2023 (PDT)
-=== Filmetrics Optical Measurement Systems ===
+=== Loomis Scribe & Break installed ===
+We have installed a new [https://loomisinc.com/lsd-155lt/ Loomis LSD-155LT] Automated Scribe & Break Cleaving tool in the Back-End Processing lab. Qualifications are underway. Contact [[Aidan_Hopkins|supervisor, Aidan Hopkins]], for more information.
-A [[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Filmetrics F10-RT]] for optical reflection/transmission spectra, and a [[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)|Filmetrics F50]] thin-film wafer-mapping system have been installed.  Contact Ning Cao for more info.
-// [[User:John d|John d]] 15:24, 12 December 2018 (PST)
+// [[User:John d|John d]] 09:41, 16 April 2023 (PDT)
-=== KLA Tencor Profilometer Installed ===
+=== Dektak XT installed ===
+We have replaced the old Dektak 6M with a new Dektak XT profilometer. This tool will provide robust, fast metrology for rapid in-process topography inspection.
-We have purchased a new [[Step Profilometer (KLA Tencor P-7)|KLA Tencor Stylus Profilometer]], that has been installed in Bay 4.
-// [[User:John d|John d]] 17:28, 12 September 2018 (PDT)
+// [[User:John d|John d]] 10:41, 25 January 2023 (PST)
-=== Laser Endpoint Monitors ===
+=== New Process Control data tables ===
+We have added [[Process_Group_-_Process_Control_Data|"Process Control Data"]] - data on deposition/etch repeatability - to a number of our highest used etchers and deposition tools. The datasheets are linked in multiple places, mainly on the Recipes pages for each tool, or on the general Recipes pages for [[Vacuum_Deposition_Recipes|'''Deposition Recipes''']] or [[Dry_Etching_Recipes|'''Etch Recipes''']].
-We've installed new [http://www.intellemetrics.com/LEP.htm Intellemetrics LEP500 Laser Endpoint Detection] monitoring on the [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|DSEiii]] & [[ICP_Etch_2_(Panasonic_E640)|ICP#2]] & [[ICP_Etch_1_(Panasonic_E626I)|ICP#1]] etchers.  This allows you to terminate your etch at a calibrated/modeled distance into a layer, and removes the need to calibrate etch rates for most processes.
-// [[User:John d|John d]] 09:26, 17 July 2018 (PDT)
+// [[User:John d|John d]] 16:07, 5 January 2023 (PST)
-=== Metal Processes on the Atomic Layer Deposition ===
-We now have Ruthenium (Ru) and Platinum (Pt) metal depositions developed on the [[Atomic_Layer_Deposition_(Oxford_FlexAL)|Oxford FlexAL ALD]] tool.  See the [[Atomic_Layer_Deposition_Recipes|Atomic Layer Deposition: Recipes]] page or contact [[Bill_Mitchell|Bill Mitchell]] for more information.
-// [[User:John d|Posted:]] 16:07, 01 June 2017 (PST)
-=== New Deep Silicon Etcher Online ===
-A new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use.  The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. An Intellemetrics LEP500 laser end point monitor has also been installed on the system.
-// [[User:John d|Posted:]] 22:16, 27 November 2017 (PST)
-=== 2016 Survey Results ===
-See the May 2016 {{file|Survey052016.pdf| User Survey Results}}.
-// [[User:Thibeault|Posted:]] 12:00, 01 May 2016 (PST)
-=== CAIBE Ion Mill Available ===
-The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information.
-// [[User:Thibeault|Posted:]] 12:00, 01 July 2015 (PST)
-=== NanoFiles SFTP Online ===
-Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check [http://signupmonkey.ece.ucsb.edu SignupMonkey] for details.
-// [[User:Thibeault|Posted:]] 12:00, 07 July 2013 (PST)
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+===''[[Template:News_-_Older_Articles|See older articles at this link]]''===
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