Difference between revisions of "Template:News"
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| + | <!---feedBurner name="UCSBNanofab-NewsFeed" /--> |
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| − | News from the U.C. Santa Barbara Nanofabrication Facility |
+ | ''News from the U.C. Santa Barbara Nanofabrication Facility.'' |
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| − | '''How to add |
+ | '''How to add news items''' |
* New news item should be inserted at the TOP of the list |
* New news item should be inserted at the TOP of the list |
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| − | * Item titles should have a level |
+ | * Item titles should have a level 3 heading, like so: === MyArticleTitle === |
| − | * Each item should finish with the user signature (four tildes: ~~~~) on it's own separated line. When you 'Save' the page, this will be replaced with a timestamp and your user name. |
+ | * Each item should finish with the user signature (four tildes: ~~~~) on it's own separated line. When you 'Save' the page, this will be replaced with a timestamp and your user name. |
| + | * Then delete your username, leaving only the two dashes, so "[[User:Thibeault|-- Brain Thibeault]]" becomes "[[User:Thibeault|-- ]]" |
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| + | * Also delete the "[[... (talk)]]" link |
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| + | * The timestamp determines the order of items in the feed. Items without a timestamp will show up at the end of the feed in random order. |
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| + | === SiO2 etching, High-Aspect Ratio === |
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| + | [[Bill_Mitchell|Dr. Bill Mitchell]] recently published an article detailing [[Template:Publications#Highly_Selective_and_Vertical_Etch_of_Silicon_Dioxide_using_Ruthenium_Films_as_an_Etch_Mask|'''high-aspect ratio SiO2 etching (JVST-A, May 2021)''']] in the [[ICP_Etching_Recipes#PlasmaTherm.2FSLR_Fluorine_Etcher|Plasma-Therm Fluorine ICP etcher]], using a novel Ruthenium Hard Mask. |
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| + | Ruthenium can be deposited using the [[Atomic_Layer_Deposition_Recipes#Ru_deposition_.28ALD_CHAMBER_1.29|Oxford ALD]] or [[Sputtering_Recipes#Ru_Deposition_.28Sputter_4.29|AJA Sputter]] and etched in one of the [[ICP_Etching_Recipes#Ru_.28Ruthenium.29_Etch_.28Panasonic_2.29|Panasonic ICP's]]. |
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| − | = New Deep Silicon Etcher Online = |
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| − | The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. |
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| − | = 2016 Survey Results = |
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| − | See the May 2016 {{file|Survey052016.pdf| User Survey Results}}. |
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| − | [[User:Thibeault|-- Brian Thibeault]] 12:00, 01 May 2016 (PST) |
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| − | = CAIBE Ion Mill Available = |
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| − | The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. |
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| + | You can find a full process flow at the [[ICP_Etching_Recipes#SiO2_Etching_.28Fluorine_ICP_Etcher.29|FL-ICP's Recipe Page]], in this case using a Sputtered Ru hard mask and I-line stepper lithography. |
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| − | [[User:Thibeault|-- Brian Thibeault]] 12:00, 01 July 2015 (PST) |
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| + | // [[User:John d|John d]] 08:05, 27 May 2021 (PDT) |
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| + | === Wafer Polisher available === |
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| + | We have added an [https://wiki.nanotech.ucsb.edu/wiki/Mechanical_Polisher_(Allied) Allied Wafer Polish] tool to our equipment list. Contact [[Brian Lingg]] for more information. // [[User:John d|John d]] 16:49, 10 May 2021 (PDT) |
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| + | === Digital Microscope: Olympus DSX-1000 === |
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| − | = NanoFiles SFTP Online = |
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| + | You'll see a new digital microscope in Bay 4/Metrology, that's our new [https://www.olympus-ims.com/en/microscope/dsx1000/high-resolution-model/ Olympus DSX-1000]. We are currently developing procedures, keep an eye out for training emails. |
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| − | Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check [http://signupmonkey.ece.ucsb.edu SignupMonkey] for details. |
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| + | // [[User:John d|John d]] 13:49, 8 April 2021 (PDT) |
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| + | === Raith Velion: FIB/SEM Installation === |
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| − | [[User:Thibeault|-- Brian Thibeault]] 12:00, 07 July 2013 (PST) |
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| + | We have installed a new state-of-the-art focused ion beam/electron beam tool in Bay 1. |
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| + | The Raith Velion enables synchronized interferometric stage, Focused-ion Beam Lithography with ~10nm features or less, live SEM during writing, and Electron-Beam Lithography. |
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| + | Learn more about the tool's capabilities at the Raith website: |
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| + | * [https://www.raith.com/products/velion.html?mobile=0 Raith Products: Velion]. |
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| + | * [https://www.youtube.com/watch?v=rW5w6nMhwfQ VIDEO: Synchronized FIB beam + Laser Interferometric Stage write, with live SEM] |
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| + | Tool qualification is currently underway. |
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| + | [[Dan Read|Dr. Dan Read]] is be the resident expert on this new tool. |
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| − | <noinclude>[[Category:Templates]]</noinclude> |
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Revision as of 14:59, 31 August 2021
News from the U.C. Santa Barbara Nanofabrication Facility.
SiO2 etching, High-Aspect Ratio
Dr. Bill Mitchell recently published an article detailing high-aspect ratio SiO2 etching (JVST-A, May 2021) in the Plasma-Therm Fluorine ICP etcher, using a novel Ruthenium Hard Mask.
Ruthenium can be deposited using the Oxford ALD or AJA Sputter and etched in one of the Panasonic ICP's.
You can find a full process flow at the FL-ICP's Recipe Page, in this case using a Sputtered Ru hard mask and I-line stepper lithography. // John d 08:05, 27 May 2021 (PDT)
Wafer Polisher available
We have added an Allied Wafer Polish tool to our equipment list. Contact Brian Lingg for more information. // John d 16:49, 10 May 2021 (PDT)
Digital Microscope: Olympus DSX-1000
You'll see a new digital microscope in Bay 4/Metrology, that's our new Olympus DSX-1000. We are currently developing procedures, keep an eye out for training emails. // John d 13:49, 8 April 2021 (PDT)
Raith Velion: FIB/SEM Installation
We have installed a new state-of-the-art focused ion beam/electron beam tool in Bay 1. The Raith Velion enables synchronized interferometric stage, Focused-ion Beam Lithography with ~10nm features or less, live SEM during writing, and Electron-Beam Lithography.
Learn more about the tool's capabilities at the Raith website:
- Raith Products: Velion.
- VIDEO: Synchronized FIB beam + Laser Interferometric Stage write, with live SEM
Tool qualification is currently underway. Dr. Dan Read is be the resident expert on this new tool.
// John d 06:53, 30 November 2020 (PST)