Difference between revisions of "Template:News"

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The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use.  The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer.  
 
The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use.  The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer.  
  
[[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST)
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[[User:John d|-- ]] 22:16, 27 November 2017 (PST)
  
  
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The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information.  
 
The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information.  
  
12:00, 01 July 2015 (PST)
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[[User:Thibeault|-- ]] 12:00, 01 July 2015 (PST)
  
  

Revision as of 11:00, 28 November 2017

News from the U.C. Santa Barbara Nanofabrication Facility.

New Deep Silicon Etcher Online

The new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer.

-- 22:16, 27 November 2017 (PST)


2016 Survey Results

See the May 2016 User Survey Results.

-- Brian Thibeault 12:00, 01 May 2016 (PST)


CAIBE Ion Mill Available

The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information.

-- 12:00, 01 July 2015 (PST)


NanoFiles SFTP Online

Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details.

-- Brian Thibeault 12:00, 07 July 2013 (PST)