Difference between revisions of "Template:News"

Latest revision as of 22:06, 16 November 2023

News from the U.C. Santa Barbara Nanofabrication Facility.

NanoFab staff awarded Goleta's Innovator of the Year 2023

NanoFab staff member Demis D. John has been awarded the City of Goleta's "Innovator of the Year" for 2023! The award stems from the UCSB Nanofab's impact on the communities of Santa Barbara County and surrounding regions, in enabling cutting edge technology companies to thrive, which also enables many local careers in advanced high-tech. See the full announcement by the Santa Barbara South Coast Chamber of Commerce. //John d 13:58, 7 November 2023 (PST)

NanoFab Featured in Regional Tech Videos

The UCSB NanoFab is showcased as a driver of innovation and enabler of the regional high-tech industry.

See the videos here:

Santa Barbara County: This is TechTopia	UCSB NanoFab: An Innovation Center

// John d 09:26, 1 November 2023 (PST)

CHIPS Act Award Announced to USC and UCSB NanoFab

U.S. Congressman Salud Carbajal congratulates UCSB and the NanoFab on receiving a CHIPS & Science Act award, as part of the California DREAMS Hub (Microelectronics Commons) led by USC. // Demis 12:06, 4 October 2023 (PDT)

JEOL SEM's Installed

Both SEM's have been replaced with new JEOL SEM's #1 and SEM #2. SEM#1 has the NABITY lithography system installed, and SEM #2 has always-on EDAX elemental analysis. Contact the supervisor, Aidan Hopkins, for more information. // John d 18:31, 20 September 2023 (PDT)

Wide FOV Microscope Installed

We have installed an AmScope stereo microscope in Bay 4 for wide field-of-view digital imaging/capture, with >2cm of FOV currently available. Wiki page here: AmScope Wide Field of View Stereoscope // John d 14:52, 19 April 2023 (PDT)

Loomis Scribe & Break installed

We have installed a new Loomis LSD-155LT Automated Scribe & Break Cleaving tool in the Back-End Processing lab. Qualifications are underway. Contact supervisor, Aidan Hopkins, for more information. // John d 09:41, 16 April 2023 (PDT)

Dektak XT installed

We have replaced the old Dektak 6M with a new Dektak XT profilometer. This tool will provide robust, fast metrology for rapid in-process topography inspection. // John d 10:41, 25 January 2023 (PST)

New Process Control data tables

We have added "Process Control Data" - data on deposition/etch repeatability - to a number of our highest used etchers and deposition tools. The datasheets are linked in multiple places, mainly on the Recipes pages for each tool, or on the general Recipes pages for Deposition Recipes or Etch Recipes. // John d 16:07, 5 January 2023 (PST)

See older articles at this link

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 <!-------- NEWS ITEMS: newest on top -------->
+=== NanoFab staff awarded Goleta's Innovator of the Year 2023 ===
+NanoFab staff member [[Demis D. John]] has been awarded the ''City of Goleta's "Innovator of the Year"'' for 2023! The award stems from the UCSB Nanofab's impact on the communities of Santa Barbara County and surrounding regions, in enabling cutting edge technology companies to thrive, which also enables many local careers in advanced high-tech.  See the [https://sbscchamber.com/goletas-finest-2023-award-recipients-announced/ full announcement by the Santa Barbara South Coast Chamber of Commerce]. //[[User:John d|John d]] 13:58, 7 November 2023 (PST)
-=== Oxford PlasmaPro ICP Etcher Cobra installed ===
+=== NanoFab Featured in Regional Tech Videos ===
+The UCSB NanoFab is showcased as a driver of innovation and enabler of the regional high-tech industry.
-We have a new ICP etcher in Bay 2:
-[[Oxford_ICP_Etcher_(PlasmaPro_100_Cobra)]]
+See the videos here:
-The tool has been qualified for InP Ridge and InGaAsP Grating etches, and is intended for III-V etching in general (GaAs, GaN, GaSb etc.)
+{| class="wikitable"
+|[https://fast.wistia.net/embed/iframe/l46hsnwg4b?controlsVisibleOnLoad=true&muted=0&playerColor&copyLinkAndThumbnailEnabled=false '''''Santa Barbara County: This is TechTopia'''''] [[File:Techtopia_Vid_-_Thumbnail_PlayButton.jpg|none|300x300px|link=https://fast.wistia.net/embed/iframe/l46hsnwg4b?controlsVisibleOnLoad=true&muted=0&playerColor&copyLinkAndThumbnailEnabled=false]]
+|[https://www.youtube.com/watch?v=op746os6eRI '''''UCSB NanoFab: An Innovation Center'''''] [[File:NanoFab_COE_Engineering_Vid_-_thumbnail_2_crop.jpg|none|300x300px|link=https://www.youtube.com/watch?v=op746os6eRI]]
-In addition, the tool is capable of Atomic Layer Etching on various materials.  Contact [[Tony_Bosch | the supervisor]] for training.
+|}
-// [[User:John d|John d]] 11:27, 29 September 2021 (PDT)
+// [[User:John d|John d]] 09:26, 1 November 2023 (PST)
+=== CHIPS Act Award Announced to USC and UCSB NanoFab ===
-=== SiO2 etching, High-Aspect Ratio ===
+[https://carbajal.house.gov/news/documentsingle.aspx?DocumentID=1672 U.S. Congressman Salud Carbajal congratulates UCSB and the NanoFab] on receiving a [https://www.nist.gov/chips CHIPS & Science Act] award, as part of the [https://microelectronicscommons.org/ California DREAMS Hub (Microelectronics Commons) led by USC].
-[[Bill_Mitchell|Dr. Bill Mitchell]] recently published an article detailing [[Template:Publications#Highly_Selective_and_Vertical_Etch_of_Silicon_Dioxide_using_Ruthenium_Films_as_an_Etch_Mask|'''high-aspect ratio SiO2 etching (JVST-A, May 2021)''']] in the [[ICP_Etching_Recipes#PlasmaTherm.2FSLR_Fluorine_Etcher|Plasma-Therm Fluorine ICP etcher]], using a novel Ruthenium Hard Mask.
+// [[User:John d|Demis]] 12:06, 4 October 2023 (PDT)
+=== JEOL SEM's Installed ===
-Ruthenium can be deposited using the [[Atomic_Layer_Deposition_Recipes#Ru_deposition_.28ALD_CHAMBER_1.29|Oxford ALD]] or [[Sputtering_Recipes#Ru_Deposition_.28Sputter_4.29|AJA Sputter]] and etched in one of the [[ICP_Etching_Recipes#Ru_.28Ruthenium.29_Etch_.28Panasonic_2.29|Panasonic ICP's]].
+Both SEM's have been replaced with new JEOL [[SEM_1_(JEOL_IT800SHL)|SEM's #1]] and [[Field_Emission_SEM_2_(JEOL_IT800SHL)|SEM #2]]. SEM#1 has the NABITY lithography system installed, and SEM #2 has always-on EDAX elemental analysis. Contact the [[Aidan_Hopkins|supervisor, Aidan Hopkins]], for more information.
+// [[User:John d|John d]] 18:31, 20 September 2023 (PDT)
+=== Wide FOV Microscope Installed ===
-You can find a full process flow at the [[ICP_Etching_Recipes#SiO2_Etching_.28Fluorine_ICP_Etcher.29|FL-ICP's Recipe Page]], in this case using a Sputtered Ru hard mask and I-line stepper lithography.
+We have installed an AmScope stereo microscope in Bay 4 for wide field-of-view digital imaging/capture, with >2cm of FOV currently available.  Wiki page here: [[Microscopes#Microscope_.238:_AmScope_Wide_Field_of_View_Stereoscope_.28Bay_4.29|AmScope Wide Field of View Stereoscope]]
-// [[User:John d|John d]] 08:05, 27 May 2021 (PDT)
+// [[User:John d|John d]] 14:52, 19 April 2023 (PDT)
-=== Wafer Polisher available ===
+=== Loomis Scribe & Break installed ===
+We have installed a new [https://loomisinc.com/lsd-155lt/ Loomis LSD-155LT] Automated Scribe & Break Cleaving tool in the Back-End Processing lab. Qualifications are underway. Contact [[Aidan_Hopkins|supervisor, Aidan Hopkins]], for more information.
-We have added an [https://wiki.nanotech.ucsb.edu/wiki/Mechanical_Polisher_(Allied) Allied Wafer Polish] tool to our equipment list. Contact [[Brian Lingg]] for more information.  // [[User:John d|John d]] 16:49, 10 May 2021 (PDT)
+// [[User:John d|John d]] 09:41, 16 April 2023 (PDT)
-=== Digital Microscope: Olympus DSX-1000 ===
+=== Dektak XT installed ===
+We have replaced the old Dektak 6M with a new Dektak XT profilometer. This tool will provide robust, fast metrology for rapid in-process topography inspection.
-You'll see a new digital microscope in Bay 4/Metrology, that's our new [https://www.olympus-ims.com/en/microscope/dsx1000/high-resolution-model/ Olympus DSX-1000]. We are currently developing procedures, keep an eye out for training emails.
-// [[User:John d|John d]] 13:49, 8 April 2021 (PDT)
+// [[User:John d|John d]] 10:41, 25 January 2023 (PST)
-=== Raith Velion: FIB/SEM Installation ===
+=== New Process Control data tables ===
+We have added [[Process_Group_-_Process_Control_Data|"Process Control Data"]] - data on deposition/etch repeatability - to a number of our highest used etchers and deposition tools. The datasheets are linked in multiple places, mainly on the Recipes pages for each tool, or on the general Recipes pages for [[Vacuum_Deposition_Recipes|'''Deposition Recipes''']] or [[Dry_Etching_Recipes|'''Etch Recipes''']].
-We have installed a new state-of-the-art focused ion beam/electron beam tool in Bay 1.
+// [[User:John d|John d]] 16:07, 5 January 2023 (PST)
-The Raith Velion enables synchronized interferometric stage, Focused-ion Beam Lithography with ~10nm features or less, live SEM during writing, and Electron-Beam Lithography.
+<!---------- end of announcements ------------>
-Learn more about the tool's capabilities at the Raith website:
+<!---------------------------------------------->
-* [https://www.raith.com/products/velion.html?mobile=0 Raith Products: Velion].
+<!--DO NOT EDIT BELOW THIS LINE-->
-* [https://www.youtube.com/watch?v=rW5w6nMhwfQ VIDEO: Synchronized FIB beam + Laser Interferometric Stage write, with live SEM]
+===''[[Template:News_-_Older_Articles|See older articles at this link]]''===
+<endfeed />
-Tool qualification is currently underway.
+<noinclude>[[Category:Templates]]</noinclude>
-[[Dan Read|Dr. Dan Read]] is be the resident expert on this new tool.
-// [[User:John d|John d]] 06:53, 30 November 2020 (PST)