Difference between revisions of "Template:LithRecipe Table"
Jump to navigation
Jump to search
| Line 4: | Line 4: | ||
| width="65" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200)]] |
| width="65" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200)]] |
||
| width="65" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV)]] |
| width="65" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV)]] |
||
| − | | width=" |
+ | | width="30" bgcolor="#DAF1FF" | [[Flood_Exposure_Recipes#DUV Flood Expose|DUV Flood]] |
| width="65" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#Field Emission SEM 1 (FEI Sirion)|Field Emission SEM 1 (FEI Sirion)]] |
| width="65" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#Field Emission SEM 1 (FEI Sirion)|Field Emission SEM 1 (FEI Sirion)]] |
||
| width="65" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#E-Beam Lithography System (JEOL JBX-6300FS)|E-Beam Lithography System (JEOL JBX-6300FS)]] |
| width="65" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#E-Beam Lithography System (JEOL JBX-6300FS)|E-Beam Lithography System (JEOL JBX-6300FS)]] |
||
Revision as of 07:57, 21 August 2012
| width="65" bgcolor="#DAF1FF" | Suss Aligners | width="65" bgcolor="#DAF1FF" | Contact Aligner | width="65" bgcolor="#DAF1FF" | Stepper 1 (GCA 6300) | width="65" bgcolor="#DAF1FF" | Stepper 2 (AutoStep 200) | width="65" bgcolor="#DAF1FF" | Stepper 3 (ASML DUV) | width="30" bgcolor="#DAF1FF" | DUV Flood | width="65" bgcolor="#DAF1FF" | Field Emission SEM 1 (FEI Sirion) | width="65" bgcolor="#DAF1FF" | E-Beam Lithography System (JEOL JBX-6300FS)