Difference between revisions of "Template:Announcements"

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(asml UP, editing issue)
(ASML update, system up, software fixed)
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<!------------- Equipment Status ---------------->
 
<!------------- Equipment Status ---------------->
  
===== ASML Up, Job editing issue =====
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===== ASML Up =====
  
 
System is fully calibrated and ready to use. We are running a newer computer, so we expect there to be some differences.
 
System is fully calibrated and ready to use. We are running a newer computer, so we expect there to be some differences.
  
There is an issue preventing users from editing jobs, but existing jobs can be run for exposure.
+
Old jobs have been copied over, software options restored, and all old Jobs can be run/edited without issue.
  
One non-blocking issue: when loading my old test-exposure job, I got a "Consistency error detected" when I Appended the Batch.  Clicking [Continue] did expose the whole wafer without issue.  I've notified ASML, they will get back to us with a solution.
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Nanofiles sync & JobCreator functionality will be restored in the next 2 weeks.
// [[User:John d|John d]] 18:59, 27 June 2022 (PDT)
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 +
// [[User:John d|John d]] 09:44, 28 June 2022 (PDT)
  
 
===== Face-Masks Optional as of June 13 =====
 
===== Face-Masks Optional as of June 13 =====

Revision as of 09:44, 28 June 2022

Important Announcements


ASML Up

System is fully calibrated and ready to use. We are running a newer computer, so we expect there to be some differences.

Old jobs have been copied over, software options restored, and all old Jobs can be run/edited without issue.

Nanofiles sync & JobCreator functionality will be restored in the next 2 weeks.

// John d 09:44, 28 June 2022 (PDT)

Face-Masks Optional as of June 13

You are not required to wear a mask in UC buildings at this time. You are also not required to wear a mask in the Nanofab if desired.

We will still provide masks at the metal table in front of the cleanroom entry. See the UCSB announcement at this link.

See the full policies at COVID-19_User_Policies // John d 11:20, 13 June 2022 (PDT)

PureStrip Bath Heater UP

The temperature controller on the PureStrip vertical bath in Bay 4 acid bench has been replaced, it is ready for use. // John d 08:29, 21 June 2022 (PDT)

Unaxis-Dep: Up

New bottle of Deuterated Silane (SiD4) has been installed, we've qualified the SiO2 process and it looks good. Films are ready to use. // John d 10:11, 17 June 2022 (PDT)

Gasonics Down

Leak in main chamber, tool is down. // John d 14:35, 27 May 2022 (PDT)

New EBL Rates

Effective Dec.1, 2021, all of our electron beam lithography rates are lowered. The new rates are as follows:

Industrial Users: $405/hour

UC Academic Users: $126/hour

Non-UC Academic Users: $150/hour

UCSB CNSI Incubator USers: $260/hour

//Thibeault 12:21, 9 December 2021 (PST)