Difference between revisions of "Template:Announcements"
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<!------------- Equipment Status ----------------> |
<!------------- Equipment Status ----------------> |
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| − | ===== ASML |
+ | ===== ASML Up, Job editing issue ===== |
| + | System is fully calibrated and ready to use. We are running a newer computer, so we expect there to be some differences. |
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| − | All systems are up and running. New Temp Ctl Unit installed & stabilizing. We will run wafer cals on Monday. |
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| − | We expect system to be ready for use by the end of the day Monday. |
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| + | There is an issue preventing users from editing jobs, but existing jobs can be run for exposure. |
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| − | New computer and new Mains Power supply have been installed, along with one rack CPU board that failed - these are all operating nominally so far. Nanofiles sync & JobCreator will be reinstituted later next week/following week. All user jobs have be copied over. |
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| + | |||
| ⚫ | |||
| + | One non-blocking issue: when loading my old test-exposure job, I got a "Consistency error detected" when I Appended the Batch. Clicking [Continue] did expose the whole wafer without issue. I've notified ASML, they will get back to us with a solution. |
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| ⚫ | |||
===== Face-Masks Optional as of June 13 ===== |
===== Face-Masks Optional as of June 13 ===== |
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Revision as of 18:59, 27 June 2022
Important Announcements
ASML Up, Job editing issue
System is fully calibrated and ready to use. We are running a newer computer, so we expect there to be some differences.
There is an issue preventing users from editing jobs, but existing jobs can be run for exposure.
One non-blocking issue: when loading my old test-exposure job, I got a "Consistency error detected" when I Appended the Batch. Clicking [Continue] did expose the whole wafer without issue. I've notified ASML, they will get back to us with a solution. // John d 18:59, 27 June 2022 (PDT)
Face-Masks Optional as of June 13
You are not required to wear a mask in UC buildings at this time. You are also not required to wear a mask in the Nanofab if desired.
We will still provide masks at the metal table in front of the cleanroom entry. See the UCSB announcement at this link.
See the full policies at COVID-19_User_Policies // John d 11:20, 13 June 2022 (PDT)
PureStrip Bath Heater UP
The temperature controller on the PureStrip vertical bath in Bay 4 acid bench has been replaced, it is ready for use. // John d 08:29, 21 June 2022 (PDT)
Unaxis-Dep: Up
New bottle of Deuterated Silane (SiD4) has been installed, we've qualified the SiO2 process and it looks good. Films are ready to use. // John d 10:11, 17 June 2022 (PDT)
Gasonics Down
Leak in main chamber, tool is down. // John d 14:35, 27 May 2022 (PDT)
New EBL Rates
Effective Dec.1, 2021, all of our electron beam lithography rates are lowered. The new rates are as follows:
Industrial Users: $405/hour
UC Academic Users: $126/hour
Non-UC Academic Users: $150/hour
UCSB CNSI Incubator USers: $260/hour
//Thibeault 12:21, 9 December 2021 (PST)