Difference between revisions of "Template:Announcements"
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<!------------- Equipment Status ----------------> |
<!------------- Equipment Status ----------------> |
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| − | ===== ASML Up |
+ | ===== ASML Up; Network status ===== |
| − | + | We are running a newer computer; |
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| + | Nanofiles sync & JobCreator functionality will be restored in the next few weeks. |
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| ⚫ | |||
| − | There is an issue preventing users from editing jobs, but existing jobs can be run for exposure. |
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| − | One non-blocking issue: when loading my old test-exposure job, I got a "Consistency error detected" when I Appended the Batch. Clicking [Continue] did expose the whole wafer without issue. I've notified ASML, they will get back to us with a solution. |
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===== Face-Masks Optional as of June 13 ===== |
===== Face-Masks Optional as of June 13 ===== |
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See the full policies at '''[[COVID-19_User_Policies]]''' |
See the full policies at '''[[COVID-19_User_Policies]]''' |
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// [[User:John d|John d]] 11:20, 13 June 2022 (PDT) |
// [[User:John d|John d]] 11:20, 13 June 2022 (PDT) |
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| − | ===== PureStrip Bath Heater UP ===== |
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| − | The temperature controller on the PureStrip vertical bath in Bay 4 acid bench has been replaced, it is ready for use. |
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| − | // [[User:John d|John d]] 08:29, 21 June 2022 (PDT) |
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| − | |||
| − | ===== Unaxis-Dep: Up ===== |
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| − | New bottle of Deuterated Silane (SiD4) has been installed, we've qualified the SiO2 process and it looks good. Films are ready to use. |
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| − | // [[User:John d|John d]] 10:11, 17 June 2022 (PDT) |
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| − | |||
| − | ===== Gasonics Down ===== |
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| − | Leak in main chamber, tool is down. |
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| − | // [[User:John d|John d]] 14:35, 27 May 2022 (PDT) |
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===== New EBL Rates ===== |
===== New EBL Rates ===== |
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Revision as of 09:00, 22 July 2022
Important Announcements
ASML Up; Network status
We are running a newer computer; Nanofiles sync & JobCreator functionality will be restored in the next few weeks.
// John d 09:00, 22 July 2022 (PDT)
Face-Masks Optional as of June 13
You are not required to wear a mask in UC buildings at this time. You are also not required to wear a mask in the Nanofab if desired.
We will still provide masks at the metal table in front of the cleanroom entry. See the UCSB announcement at this link.
See the full policies at COVID-19_User_Policies // John d 11:20, 13 June 2022 (PDT)
New EBL Rates
Effective Dec.1, 2021, all of our electron beam lithography rates are lowered. The new rates are as follows:
Industrial Users: $405/hour
UC Academic Users: $126/hour
Non-UC Academic Users: $150/hour
UCSB CNSI Incubator USers: $260/hour
//Thibeault 12:21, 9 December 2021 (PST)