Difference between revisions of "Template:Announcements"
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<!------------- Equipment Status ----------------> |
<!------------- Equipment Status ----------------> |
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| − | ===== |
+ | ===== ASML Up; Network status ===== |
| − | The [[Optical_Film_Thickness_%26_Wafer-Mapping_(Filmetrics_F50)|Filmetrics F50 Wafer Mapper]] is repaired and up. |
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| + | We are running a newer computer; |
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| − | Tool has been relocated to Bay 7, just before the EBL room. |
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| + | Nanofiles sync & JobCreator functionality will be restored in the next few weeks. |
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| − | ===== F10-RT Down ===== |
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| − | The '''[[Optical_Film_Spectra_%2B_Optical_Properties_(Filmetrics_F10-RT-UVX)|Filmetrics F10-RT]]''' is down for possible failed harddrive. We are working to repair it. |
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| + | ===== Face-Masks Optional as of June 13 ===== |
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| − | The '''[[Filmetrics_F40-UV_Microscope-Mounted|Filmetrics F40-UV]]''', also in Bay 4, can do similar reflectance measurements (but not transmission measurements). |
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| + | You are not required to wear a mask in UC buildings at this time. You are also not required to wear a mask in the Nanofab if desired. |
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| + | We will still provide masks at the metal table in front of the cleanroom entry. |
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| − | If you need transmission measurement, the [[Ellipsometer_(Woollam)|Woolam Ellipsometer]] can do this, but may need some work to produce identical results (figuring out sample holders etc.). Let us know if you need that. |
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| + | See the [https://t.e2ma.net/webview/be2nag/25634e9f535619ce1f4eb976598e7268 UCSB announcement at this link]. |
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| − | // [[User:John d|John d]] 08:40, 4 May 2022 (PDT) |
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| − | ===== LEXT Confocal: DOWN ===== |
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| − | LEXT Confocal microscope is down, please check email for updates. |
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| − | For general motorized microscopy, you may consider the new [[Digital_Microscope_(Olympus_DSX1000)|Olympus DSX-1000]]. |
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| − | // [[User:John d|John d]] 16:08, 21 March 2022 (PDT) |
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| − | ===== New COVID protocols ===== |
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| − | Please read the linked letter below (on Wiki) regarding masking policy changes, effective Saturday, March 19. |
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| − | The nanofab will follow this policy with masks being optional for everyone in all sections of the facility beginning March 19. |
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| − | All users must adhere to the campus policies as outlined in the letter from Chancellor Yang, including testing where required. |
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| − | Link: [https://t.e2ma.net/message/opq87n/0equghb March 16th 2022- Letter from Office of the Chancellor] |
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See the full policies at '''[[COVID-19_User_Policies]]''' |
See the full policies at '''[[COVID-19_User_Policies]]''' |
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| − | // [[User:John d|John d]] |
+ | // [[User:John d|John d]] 11:20, 13 June 2022 (PDT) |
===== New EBL Rates ===== |
===== New EBL Rates ===== |
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Revision as of 09:00, 22 July 2022
Important Announcements
ASML Up; Network status
We are running a newer computer; Nanofiles sync & JobCreator functionality will be restored in the next few weeks.
// John d 09:00, 22 July 2022 (PDT)
Face-Masks Optional as of June 13
You are not required to wear a mask in UC buildings at this time. You are also not required to wear a mask in the Nanofab if desired.
We will still provide masks at the metal table in front of the cleanroom entry. See the UCSB announcement at this link.
See the full policies at COVID-19_User_Policies // John d 11:20, 13 June 2022 (PDT)
New EBL Rates
Effective Dec.1, 2021, all of our electron beam lithography rates are lowered. The new rates are as follows:
Industrial Users: $405/hour
UC Academic Users: $126/hour
Non-UC Academic Users: $150/hour
UCSB CNSI Incubator USers: $260/hour
//Thibeault 12:21, 9 December 2021 (PST)