Difference between revisions of "Template:Announcements"
(IBD down; Stepper 6300 maint.) |
(DUV scope update) |
||
| Line 8: | Line 8: | ||
<!----------------------------------------------> |
<!----------------------------------------------> |
||
<!------------- Announcements ----------------> |
<!------------- Announcements ----------------> |
||
| + | |||
| + | ===== Deep-UV uScope Operational ===== |
||
| + | The DUV Microscope is now repaired and operational. |
||
| + | // [[User:John d|John d]] 23:49, 30 August 2018 (PDT) |
||
===== GCA 6300 Maintenance ===== |
===== GCA 6300 Maintenance ===== |
||
Revision as of 23:49, 30 August 2018
UCSB NanoFab Announcements
Deep-UV uScope Operational
The DUV Microscope is now repaired and operational. // John d 23:49, 30 August 2018 (PDT)
GCA 6300 Maintenance
The GCA 6300 will be down 09/12/18 thru 09/13/18 from 8:00 am until 6:30 pm both days for service. The system will be available for your use both days after 6:30 pm. Please schedule your process accordingly. // John d 15:19, 29 August 2018 (PDT)
IBD Down
The 8/27 power outage has damaged something in the communications network. // John d 15:19, 29 August 2018 (PDT)
Ebeam#2: System UP
System up. Heater is back on-line. Read email carefully about new policies for use. Thibeault 17:06, 21 August 2018 (PDT)
PECVD#1: Software Upgrade
Plasmatherm will be upgrading the system software on September 17th. The upgrade will take 3-5 days. After the upgrade is complete, everyone must be re-certified to use the tool. Please document any custom recipes that you may have, in case they can't be copied over. // John d 06:38, 15 August 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)