Difference between revisions of "Template:Announcements"
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<!------------- Announcements ----------------> |
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− | ===== Ebeam#2: |
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System up. Heater is back on-line. Read email carefully about new policies for use. |
System up. Heater is back on-line. Read email carefully about new policies for use. |
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[[User:Thibeault|Thibeault]] 17:06, 21 August 2018 (PDT) |
[[User:Thibeault|Thibeault]] 17:06, 21 August 2018 (PDT) |
Revision as of 17:08, 21 August 2018
UCSB NanoFab Announcements
Ebeam#2: System UP
System up. Heater is back on-line. Read email carefully about new policies for use. Thibeault 17:06, 21 August 2018 (PDT)
PECVD#1: Software Upgrade
Plasmatherm will be upgrading the system software on September 17th. The upgrade will take 3-5 days. After the upgrade is complete, everyone must be re-certified to use the tool. Please document any custom recipes that you may have, in case they can't be copied over. // John d 06:38, 15 August 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)